Rotating total internal reflection microscopy method and device with feedback function

A total internal reflection and total reflection technology, applied in microscopes, optics, instruments, etc., can solve problems such as insufficient illumination angle control accuracy, inability to adjust in real time, uneven illumination light field, etc., to achieve good illumination uniformity and imaging resolution , the effect of high angle control resolution

Active Publication Date: 2016-12-14
ZHEJIANG UNIV
View PDF6 Cites 12 Cited by
  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

However, due to the existence of laser speckle, the illumination light field will be uneven. For this reason, a rotating total internal reflection microscopy method can overcome this shortcoming and achieve uniform total reflection light field illumination. In the microscopic method of rotating total reflection illumination , the lighting angle determines the lighting depth, but it belongs to an open-loop control in the adjustment process, one is to judge the lighting angle according to the imaging situation, but the control accuracy of the lighting angle is not enough in this process, and it cannot be adjusted in real time

Method used

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
View more

Image

Smart Image Click on the blue labels to locate them in the text.
Viewing Examples
Smart Image
  • Rotating total internal reflection microscopy method and device with feedback function
  • Rotating total internal reflection microscopy method and device with feedback function
  • Rotating total internal reflection microscopy method and device with feedback function

Examples

Experimental program
Comparison scheme
Effect test

Embodiment Construction

[0034] The present invention will be described in detail below in conjunction with the embodiments and accompanying drawings, but the present invention is not limited thereto.

[0035] Such as figure 1 As shown, a rotating total internal reflection microscope device with feedback includes: laser 1, first collimating lens 2, two-dimensional scanning system 3, scanning lens 4, second collimating lens 5, "X" type Beam mirror 6, dichroic mirror 7, microscope field mirror 8, microscope objective lens 9, sample 10, optical filter 11, CCD12, focusing mirror 13, position detection and calibration CCD14 and main control computer 15.

[0036] The transmittance ratio of the single-layer film of the "X" beam splitter is more than 90%. When the light is irradiated on the "X" beam splitter, more than 80% of the light intensity will be transmitted through the beam splitter, and less than 20% of the light intensity will be transmitted through the beam splitter. Strong will be reflected by th...

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to view more

PUM

No PUM Login to view more

Abstract

The invention discloses a rotating total internal reflection microscopy device with a feedback function. The device comprises a laser device, a two-dimensional scanning galvanometer, a scanning lens, a collimating lens, a dichroic mirror, a beam splitter, a dichroic mirror, a microscopic field lens, a total reflection microobjective and a sample which are arranged in sequence along an optical path, a light intensity position detector located on the reflection optical path of the beam splitter, a computer and a CCD used for acquiring the sample and emitting fluorescent light, wherein the light intensity position detector is used for collecting illuminating light which is emitted by the laser device and reflected by the beam splitter to obtain a first light spot and collecting sample light formed after total reflection of the position of the sample to obtain a second light spot, and the computer is used for obtaining total reflection illumination angle and evanescent wave penetration depth through feedback according to the position information of the first light spot and the second light spot. The invention further discloses a rotating total internal reflection microscopy method with the feedback function. Through synchronous feedback control of the sample and the microobjective, it can be guaranteed that the sample is located on the optimal illumination face and the optimal imaging face, and illumination uniformity and imaging resolution are higher.

Description

technical field [0001] The invention relates to the field of microscopic imaging, in particular to a rotating total internal reflection microscopic method and device with feedback. Background technique [0002] With the development of biological science research, especially the study of membrane-related biological phenomena, there is a strong demand for a microscopic method that only observes the structure of single-layer samples. In the traditional microscopy method, the entire field of view is illuminated by the illumination beam in the z-axis direction during illumination, and the resolution and signal-to-noise ratio in the z-axis direction have not been high. For this reason, light sectioning microscope and total internal reflection microscope ( Tirf) are technical means to improve the z-axis resolution. [0003] Light section microscope adopts the method of lateral illumination, but due to the existence of the diffraction limit, the thinnest beam of lateral illuminatio...

Claims

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to view more

Application Information

Patent Timeline
no application Login to view more
Patent Type & Authority Applications(China)
IPC IPC(8): G02B21/06
CPCG02B21/06
Inventor 刘旭修鹏匡翠方许迎科
Owner ZHEJIANG UNIV
Who we serve
  • R&D Engineer
  • R&D Manager
  • IP Professional
Why Eureka
  • Industry Leading Data Capabilities
  • Powerful AI technology
  • Patent DNA Extraction
Social media
Try Eureka
PatSnap group products