A structure of high-precision lithography equipment for large-aperture planar optical parts

Abstract

A structure of high-precision lithography equipment for large-caliber planar optical parts, consisting of a pressing block (1), an exposure platform (2), an oversized bearing (3), a shutter (4), a black coating layer (5), and an exposure light source (6) , an exposure chamber (7), a photolithography piece (8), and a mask (9), and is characterized in that the exposure mode is adopted, and the exposure light source (6) is positioned under the exposure platform (2); the exposure light source (6) It is a light source group, placed at the bottom of the exposure chamber (7); the shutter (4) is located between the exposure light source (6) and the exposure platform; the oversized bearing (3) can rotate around its central Z-axis to drive the exposure platform (2) Rotate in the same direction to ensure the uniformity of illuminance on the surface of the optical parts; the black coating layer (5) is coated on the inner surface of the exposure cavity (7). The invention can solve the problem of high-precision lithography of large-diameter planar optical parts that cannot be solved by domestic standard lithography equipment. The accuracy of exposure line width can reach ±0.5 μm, the maximum diameter of exposure can reach 600 mm, and the thickness of lithography parts will not be limited.

Description

A structure of high-precision lithography equipment for large-aperture planar optical parts technical field The invention belongs to the technical field of optical coating in optical processing, and relates to a photolithographic method for grid patterns in the coating of large-diameter flat infrared light windows. Background technique At present, domestic lithography equipment for large-diameter planar parts can no longer meet the requirements for use. Due to the defects of the equipment structure, the standard lithography equipment produced by domestic lithography equipment manufacturers can only reach a maximum size of 200mm×200mm, and the thickness is only allowed to be controlled within 5mm; it cannot meet the current large-aperture planar infrared in the aviation field. For the lithography requirements of light windows, the maximum size of this type of infrared light window has reached 600mm, and the maximum thickness has reached 15mm. By designing a special equipm...

AI Technical Summary

Problems solved by technology

The exposure light source 6 is an ordinary ultraviolet light tube group, which replaces the complex ultraviolet parallel light source system and solves the problem of making ultraviolet parallel light sources during photolithography of large-diameter photolithographic pieces;

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