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Method for measuring large field-of-view telescope optical system distortion and field curvature

An optical system and measurement method technology, applied in the direction of testing optical performance, geometric characteristics/aberration measurement, etc., can solve the problems of inability to meet the application requirements of large-diameter and large-field telescopes, cumbersome operation, low precision, etc. Influence of factors, simplified measurement device, effect of reliable measurement data

Active Publication Date: 2017-02-15
INST OF OPTICS & ELECTRONICS - CHINESE ACAD OF SCI
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Problems solved by technology

[0008] In order to solve the shortcomings of the traditional measurement methods of distortion and curvature of field, such as large influence of human factors, cumbersome operation, and low precision, and the measurement methods of other optical systems cannot meet the application requirements of large aperture and large field of view telescopes, etc., this paper The invention provides a method for measuring the distortion and field curvature of the optical system of a large-field telescope

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  • Method for measuring large field-of-view telescope optical system distortion and field curvature
  • Method for measuring large field-of-view telescope optical system distortion and field curvature
  • Method for measuring large field-of-view telescope optical system distortion and field curvature

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Embodiment Construction

[0037] The present invention will be described in further detail below in conjunction with the accompanying drawings and specific embodiments.

[0038] The detection device that the present invention relates to sees figure 1 , which mainly includes a parallel light source 1 and its adjustment platform 2, a wavefront detector 4 and its moving platform 5, a computer 3, a closed-loop positioning structure composed of a computer 3, a wavefront detector 4 and a moving platform 5, and is used to detect The image point position of field telescope 6.

[0039] See figure 2 , the main detection steps are:

[0040] The first step: measure the field of view mark, select the measurement field of view according to the field of view range and measurement accuracy requirements, and mark the serial number FOV i ;

[0041] Step 2: Change the measurement field of view according to the selected measurement field of view FOV i , change the tilt and pitch attitude of the parallel light source...

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Abstract

The invention relates to a method for measuring large field-of-view telescope optical system distortion and field curvature. According to the invention, parallel light sources (1) come directly into a to-be-detected large field-of-view telescope (6). The field of view can be changed through the adjustment of the inclination and the pitching attitude of the parallel light sources (1). In the process of full field of view measurement, the to-be-detected large field-of-view telescope (6) remains to be in a fixed state. A computer (3), a wavefront detector (4) and the motion platform (5) of the wavefront detector form a closed-loop positioning structure to precisely measure and position the spatial positions of the image points of the to-be-detected large field-of-view telescope. Through the comparison of the ideal positions of the image points, the distortion and field curvature of the to-be-detected large field-of-view telescope (6) optical system can be obtained through fitting. The measuring method of the invention can be operated simply and effectively and achieves high measurement efficiency. Further, the method can perform automatic checking and can provide reliable measurement data for large field-of-view telescope optical system to correct distortion and field curvature.

Description

technical field [0001] The invention belongs to the technical field of photoelectric telescope detection, and in particular relates to a method for measuring distortion and field curvature of an optical system of a large field of view telescope. Background technique [0002] Large field of view telescopes can improve the efficiency of astronomical observation, but as the field of view increases, the distortion and field curvature of the optical system will increase. Although the distortion does not affect the clarity of the image, it affects the geometric position accuracy of the image. There will be a direct impact, causing distortion; field curvature will cause inconsistencies in the definition of the image plane, reducing the imaging quality. For large-field telescopes undertaking astrometric tasks, effective measures must be taken to suppress the effects of distortion and field curvature in order to ensure the accuracy of the telescope's measurement. Therefore, the measu...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): G01M11/02
CPCG01M11/02G01M11/0242
Inventor 张俊波张昂
Owner INST OF OPTICS & ELECTRONICS - CHINESE ACAD OF SCI
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