Rhizoma Paridis artificial seedling growing method

A heavy building, artificial technology, applied in the fields of botany equipment and methods, horticulture, plant cultivation, etc., can solve the problems of large-scale artificial planting of Yunnan heavy building, low survival rate of heavy building seedling cultivation, and long investment return period. , to achieve the effect of easy promotion, good economic and social benefits, and simple methods
CN106416655AInactive Publication Date: 2017-02-22景谷雄剑重楼种植专业合作社

Patent Information

Authority / Receiving Office
CN · China
Patent Type
Applications(China)
Current Assignee / Owner
景谷雄剑重楼种植专业合作社
Publication Date
2017-02-22
Estimated Expiration
Not applicable · inactive patent
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Abstract

A Rhizoma Paridis artificial seedling growing method comprises the following steps: 1, seed selection and processing; 2, seedbed preparation; 3, seedbed sowing; 4, seedbed management; 5, seedling stage management. The Rhizoma Paridis artificial seedling growing method is low in seedling growing cost, and large in seeding formation quantity.
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Description

technical field

[0001] The invention relates to the technical field of planting Chinese herbal medicines, in particular to a method for artificially raising seedlings of the Chinese herbal medicine. Background technique

[0002] Chonglou, also known as unicorn lotus, seven-leaf flower, and arrow, is a perennial herb of the family Liliaceae. Chonglou likes to live in the shade under the forest with an altitude of 500-3000m, humid climate and moderate rainfall. Generally, the suitable temperature for seed germination, root growth and terminal bud germination is 18°C-20°C, 20°C for emergence, 16°C-20°C for aboveground plant growth, and 14°C-18°C for underground rhizome growth. The growth of the double building requires a shaded environment, and strong light will cause the leaves to wither. Generally, good shade is required for seed germination and seedling stage, but in the first two years before maturity, shade should be appropriately reduced and light should be increased, w...

Claims

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
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