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Method for removing a metal deposit placed on a surface in a chamber

A sediment and metal technology, applied in chemical instruments and methods, metal material coating technology, preparation of organic compounds, etc., can solve complex and expensive problems

Active Publication Date: 2017-04-19
库伯斯股份有限公司
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

The chemical mechanical etching step requires the use of a barrier layer to ensure very precise control of the method, in addition to the subsequent operation of cleaning the etched surface, which is complex and expensive

Method used

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  • Method for removing a metal deposit placed on a surface in a chamber
  • Method for removing a metal deposit placed on a surface in a chamber
  • Method for removing a metal deposit placed on a surface in a chamber

Examples

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Embodiment Construction

[0046] For different embodiments, to simplify the description, the same reference signs will be used for elements that are equivalent or provide the same function.

[0047] figure 1 A housing 1 is shown in which a support body 5 is located.

[0048] Undesirable metal deposits 2 were observed on the surfaces in the housing 1 , ie on the inner walls of the housing 1 and on the support 5 .

[0049] The metal deposit 2 may comprise at least one of the following elements: copper, titanium, tantalum, ruthenium, zinc, zirconium, vanadium, silver, gold, chromium.

[0050] The method for removing metal deposits 2 on surfaces in the housing 1 comprises a step a) of oxidizing the metal deposits 2 .

[0051] Step a) can be carried out by injecting the oxidizing species in gaseous form via the injection system 3 .

[0052] Step a) may be performed by injecting an oxidizing substance comprising at least one of the following substances: oxygen, ozone, nitrous oxide.

[0053] Such as fi...

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Abstract

The invention relates to a method for removing a metal deposit placed on a surface in a chamber. Said method includes the following steps: a) a step of oxidizing the metal deposit; b) a step of injecting chemical species that are suitable for volatilizing the oxidized metal deposit, said Step b) being at least partially implemented during Step a). Said removal method is characterized in that, in Step b), the chemical species are injected according to a sequence of pulses.

Description

technical field [0001] The present invention relates to a method of removing metal deposits on surfaces located in housings. Background technique [0002] A method known from the prior art for removing metal deposits on surfaces in housings comprises the following steps: [0003] Step a) oxidizing the metal deposit; [0004] Step b) injecting a chemical substance suitable for volatilizing the oxidized metal deposits, said step b) being carried out during at least part of step a). [0005] However, this method of removal is unsatisfactory. [0006] In fact, the chemical species suitable for volatilizing the oxidized metal deposits also react with the metal deposits before oxidizing the metal deposits. This hinders step a). [0007] Thus, the reaction of the chemical species with the metal deposits hampers this removal method, inter alia negatively affecting its effectiveness. [0008] This is the case in particular when the removal method is carried out to remove copper ...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): H01J37/32C23C14/56C23C16/44C23G5/00
CPCC23C14/564C23C16/4405C23G5/00H01J37/32862C07C45/00C07C49/167C23F1/00
Inventor 朱利安·维蒂耶洛珍-卢克·戴尔卡里法比安·皮亚拉特
Owner 库伯斯股份有限公司