A method of stealth cutting and back-plated LED chips
A LED chip and stealth cutting technology, which is applied in the direction of semiconductor devices, electrical components, circuits, etc., can solve the problems of unsatisfactory LED luminous efficiency and high shedding rate of the reflective layer, and achieve the effect of improving the light output efficiency and reducing the shedding probability
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Embodiment 1
[0032] A manufacturing method of invisible cutting and back plating of LED chips includes the following steps:
[0033] a. Growth of adhesion layer: growth of adhesion layer on the back of the wafer;
[0034] b. Film sticking: the front side of the wafer is facing up, and the back side is adhered to the white film;
[0035] c. Stealth cutting: Stealth cutting of wafers after filming;
[0036] d. Turn over: Turn the invisible cut wafer face down, and turn the back side up on another white film. Cut the area where the wafer is located, together with the white film.
[0037] e. Back-plated metal reflective layer: A metal reflective layer is plated on the adhesion layer on the back of the wafer;
[0038] f. Split: Split the wafer into a single LED chip.
[0039] In step a, an adhesion layer is grown on the sapphire substrate on the back of the wafer by PECVD technology, and the adhesion layer is SiO 2 Adhesive layer, the thickness of the adhesive layer is 10nm.
[0040] In step c, during steal...
Embodiment 2
[0044] A manufacturing method of invisible cutting and back plating of LED chips includes the following steps:
[0045] a. Growth of adhesion layer: growth of adhesion layer on the back of the wafer;
[0046] b. Film sticking: the front side of the wafer is facing up, and the back side is adhered to the white film;
[0047] c. Stealth cutting: Stealth cutting of wafers after filming;
[0048] d. Flip: Turn the invisible cut wafer face down, and turn the back side up on another white film. Cut the area where the wafer is located, together with the white film.
[0049] e. Back-plated metal reflective layer: A metal reflective layer is plated on the adhesion layer on the back of the wafer;
[0050] f. Split: Split the wafer into a single LED chip.
[0051] In step a, an adhesion layer is grown on the sapphire substrate on the back of the wafer by PECVD technology, and the adhesion layer is Si 3 N 4 Adhesive layer, the thickness of the adhesive layer is 230nm.
[0052] In step c, during stealt...
Embodiment 3
[0056] A manufacturing method of invisible cutting and back plating of LED chips includes the following steps:
[0057] b. Film sticking: the front side of the wafer is facing up, and the back side is adhered to the white film;
[0058] c. Stealth cutting: Stealth cutting of wafers after filming;
[0059] d. Turn over: Turn the invisible cut wafer face down, and turn the back side up on another white film. Cut the area where the wafer is located, together with the white film.
[0060] e. Back-plated metal reflective layer: a metal reflective layer is plated on the adhesion layer on the back of the wafer;
[0061] f. Splitting: Split the wafer into a single LED chip.
[0062] In step a, an adhesion layer is grown on the sapphire substrate on the back of the wafer by PECVD technology, and the adhesion layer is Si 3 N 4 Adhesive layer, the thickness of the adhesive layer is 100 nm.
[0063] In step c, during stealth cutting, the laser pulse frequency is 80 Hz, and the scribing speed is 100 m...
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