Polishing liquid performance continuous real-time adjusting and control device
A real-time control and polishing liquid technology, applied in grinding/polishing equipment, metal processing equipment, manufacturing tools, etc., can solve the temperature control speed and reliability constraints of the mixed liquid, the continuous real-time supply of the mixed liquid is difficult to achieve, and the solution mixing chamber The problem of large chamber volume, etc., can ensure the controllability and stability, reduce the volume and operating noise, and avoid accidental errors.
Active Publication Date: 2017-07-07
DALIAN UNIV OF TECH
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Problems solved by technology
However, the volume of the solution mixing chamber in this device is large, and it is easy to cause a large amount of mixed liquid to accumulate during the mixing and stirring process. The new solution can only be configured after it is empty. This delay feature makes it difficult to realize the continuous real-time supply of mixed solutions with different ratios.
On the other hand, the heater in this device is only installed on the outer wall of the solution mixing chamber, which restricts the speed and reliability of the temperature regulation of the mixed solution.
In addition, due to its own structural characteristics, the device cannot prepare mixed liquid containing powder components.
Method used
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[0024] The specific implementation manners of the present invention will be described in detail below in combination with technical solutions and accompanying drawings. Such as Figure 1-2 As shown, a continuous real-time control device for polishing fluid performance, including a powder component storage and delivery unit, a liquid component storage and delivery unit, a component mixing output unit, a control and an accessory unit; the powder component storage and delivery unit It is located side by side with the liquid component storage and delivery unit on the upper part of the whole device, the component mixing output unit is located under the powder component storage and delivery unit and the liquid component storage and delivery unit, and the control and accessory unit is located on the periphery of the whole device;
[0025] The powder component storage and conveying unit includes a feed inlet A 15, a powder storage tank 14, a powder stirring paddle 13, a precision spee...
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The invention discloses a polishing liquid performance continuous real-time adjusting and control device. The polishing liquid performance continuous real-time adjusting and control device comprises a powder component storage conveying unit, a liquid component storage conveying unit, a component mixing output unit and a control and attachment unit. The powder component storage conveying unit and the liquid component storage conveying unit are located on the upper portion of the whole device in parallel. The component mixing output unit is located below the powder component storage conveying unit and the liquid component storage conveying unit. The control and attachment unit is located on the periphery of the whole device. According to the polishing liquid performance continuous real-time adjusting and control device, powder component quantitative adding is achieved through the mode that a precision speed adjusting motor and a precision transmission worm are combined, powder components and all liquid components are mixed through a mixed liquid conveying pipeline, and mixed liquid containing the powder components is prepared; the temperature and flow information in the polishing liquid preparation process is grasped in real time through a control system; and relevant components are adjusted and controlled according to the required polishing liquid performance indexes (the temperature, the ratio and the flow rate), so that the precision is high.
Description
technical field [0001] The invention belongs to the technical field of precision and ultra-precision polishing, and in particular relates to a continuous real-time control device for polishing liquid performance. Background technique [0002] As an important part of precision and ultra-precision polishing, polishing fluid is widely used in polishing various difficult-to-machine materials. The main factors affecting the performance of the polishing fluid are: the distribution ratio of each component of the polishing fluid, the temperature and flow rate of the polishing fluid. At present, the configuration of polishing liquid mostly relies on manual operation, that is, the content of each component is calculated according to the total amount of polishing liquid required for processing, and obtained after weighing and mixing. However, using manual operation to configure the polishing liquid is not only time-consuming and labor-intensive, but also has obvious randomness and unc...
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IPC IPC(8): B24B57/00B24B57/02
CPCB24B57/00B24B57/02
Inventor 高航刘子源郭东明
Owner DALIAN UNIV OF TECH
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