Monocrystalline silicon piece washing device

Abstract

The invention discloses a single crystal silicon wafer cleaning device. A conveying track is arranged on a circular frame, and a plurality of single crystal silicon wafer conveying brackets are arranged on the conveying track. The conveyor inclined channel and the circular conveyor at both ends of the ring frame are equipped with a cleaning room and a drying room on the straight section of the ring frame. Each end is equipped with an inclined wave section in the tank; the top of the cleaning room is provided with a plurality of upper spray pipes that can be adjusted up and down above the inclined wave section of the inner conveyance, and there are multiple rings at one end of the ring frame. End inclined sinking cleaning tank, multiple inclined sinking cleaning tanks and the bottom of multiple ring end inclined sinking cleaning tanks are equipped with ultrasonic cleaning structure and heating structure; more effective and thorough cleaning to remove surface residues of single crystal silicon wafers No dirt and flakes, high cleaning efficiency, time-saving and labor-saving cleaning, high cleaning quality.

Description

technical field [0001] The invention relates to a single crystal silicon wafer production device, in particular to a single crystal wafer cleaning device used in the single crystal silicon wafer production process. Background technique [0002] Monocrystalline silicon wafers must be cleaned during production to avoid device failure due to contamination. The purpose of cleaning is to remove surface organic or inorganic contamination impurities. At present, when most manufacturers clean monocrystalline silicon wafers, either there are likely to be residual stains on the surface of monocrystalline silicon wafers, etc., or the cleaning devices used have problems in the cleaning process. The design of the cleaning device is reasonable. Poor performance, low cleaning efficiency, time-consuming and laborious cleaning, poor cleaning quality and effect. Contents of the invention [0003] The present invention solves the problems such as residual stains on the surface of the singl...

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Problems solved by technology

[0003] The present invention solves the problems such as residual stains on the surface of the single crystal silicon wafer when the existing single crystal silicon wafer is cleaned with a cleaning device, or the cleaning device used has a cleaning device design during the cleaning process. Poor rationality, low cleaning efficiency, time-consuming and labor-intensive cleaning, poor cleaning quality and other current conditions provide a more effective and thorough cleaning to remove residual dirt and chipping on the surface of single crystal silicon wafers, with high cleaning efficiency. The cleaning is more time-saving and labor-saving, the cleaning quality is improved, and the cleaning device design is more reasonable.

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