A kind of inverted organic photovoltaic cell and preparation method thereof
A technology of organic photovoltaic cells and light harvesting, applied in photovoltaic power generation, circuits, electrical components, etc., to achieve the effects of improving short-circuit current, reducing loss, and good integration
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Embodiment 1
[0022] Embodiment 1: The device structure is ITO / Ag / Bphen / SubPc:C 70 / TAPC / MoO 3 / Al, the device preparation steps and related process parameters are as follows.
[0023] The first step, substrate cleaning: ITO conductive glass is cleaned with acetone and glass cleaner in sequence, ultrasonically treated in acetone, deionized water, and isopropanol for 10 minutes, dried with nitrogen, and then irradiated with ultraviolet light for 10 minutes.
[0024] The second step is to open the ultra-high vacuum deposition system and load the pretreated ITO substrate and required materials; the ultra-high vacuum deposition system is evacuated to a pressure of less than 10 -4 Pa.
[0025]In the third step, an Ag nano collection layer is prepared on the ITO cathode substrate, the deposition rate is 0.02nm / s, and the deposition thickness is 0.5nm. During the deposition process, the temperature of the cathode substrate was controlled at 80 °C.
[0026] The fourth step is to prepare a Bphen...
Embodiment 2
[0031] Embodiment 2: The device structure is ITO / Ag / BCP / C 60 / Rubrene / MoO 3 / Ag, device preparation steps and related process parameters are as follows.
[0032] The first step, substrate cleaning: ITO conductive glass is cleaned with acetone and glass cleaner in sequence, ultrasonically treated in acetone, deionized water, and isopropanol for 10 minutes, dried with nitrogen, and then irradiated with ultraviolet light for 10 minutes.
[0033] The second step is to open the ultra-high vacuum deposition system and load the pretreated ITO substrate and required materials; the ultra-high vacuum deposition system is evacuated to a pressure of less than 10 -4 Pa.
[0034] The third step is to prepare an Ag nano collection layer on the ITO cathode substrate, the deposition rate is 0.1nm / s, and the deposition thickness is 2nm. During the deposition process, the temperature of the cathode substrate was controlled at 100 °C.
[0035] In the fourth step, a BCP exciton blocking layer ...
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