Response surface method-based UV/H2O2 process parameter optimization method

A technology of process parameter optimization and response surface method, applied in chemical instruments and methods, water/sludge/sewage treatment, water/sewage treatment, etc., can solve problems such as difficult to determine economical and effective process parameters, and does not consider economic factors , to achieve the effect of automatic adjustment and simplification of process parameters
CN106986413AActive Publication Date: 2017-07-28SHANDONG WATER & WASTEWATER MONITORING CENT
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Patent Information

Authority / Receiving Office
CN · China
Patent Type
Applications(China)
Current Assignee / Owner
SHANDONG WATER & WASTEWATER MONITORING CENT
Publication Date
2017-07-28

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Abstract

The invention discloses a response surface method-based UV / H2O2 process parameter optimization method which comprises the following steps: (1) designing an RSM (Response Surface Method) mixing experiment for removing a target organic matter; (2) performing the RSM mixing experiment for removing the target organic matter; (3) arranging multiple drug feeding points in a UV / H2O2 advanced oxidation pilot test device, wherein the multiple drug feeding points are respectively used for feeding H2O2 and labeling the target organic matter in a water distribution test; (4) building a target organic matter removal model, performing multi-regression fitting on experimental data by applying Design-Expert software, and building a regression equation; (5) performing variance and relevance analysis through the regression equation by adopting ANOVA (Analysis of Variance) of a response surface secondary model; and (6) determining process parameters. According to the response surface method-based UV / H2O2 process parameter optimization method, frequent adjustment of the process parameters in an actual engineering application process is simplified; and after being built, the model can be linked with an automatic control system of a UV / H2O2 advanced oxidation reactor, so as to realize automatic adjustment of the process parameters, and the cost is effectively reduced.
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Description

technical field

[0001] The invention relates to a water treatment UV / H 2 o 2 A method for optimizing advanced oxidation process parameters, especially involving a method of determining the treatment of various refractory organics and the required UV dose and H by using the response surface method 2 o 2 Dosage method. Background technique

[0002] Advanced Oxidation Processes (AOPs), also known as deep oxidation technology, is a water treatment technology that makes full use of the activity of hydroxyl radicals (·OH) to quickly and completely oxidize organic pollutants. Among them, UV / H 2 o 2 The advanced oxidation process has a good removal effect on refractory organic substances such as chloroform, dichloroacetic acid, atrazine, o-dichlorobenzene, dimethyl phthalate, and bisphenol A in water. But in practice, UV / H 2 o 2 The process has difficulty in determining the optimal dose of UV, H 2 o 2 Large investment volume, low utilization rate and excess H 2 o 2 Diffi...

Claims

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