Response surface method-based UV/H2O2 process parameter optimization method

A technology of process parameter optimization and response surface method, applied in chemical instruments and methods, water/sludge/sewage treatment, water/sewage treatment, etc., can solve problems such as difficult to determine economical and effective process parameters, and does not consider economic factors , to achieve the effect of automatic adjustment and simplification of process parameters

Active Publication Date: 2017-07-28
SHANDONG WATER & WASTEWATER MONITORING CENT
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Problems solved by technology

However, this method usually establishes a polynomial regression equation for a single organic compound, and does not consider the economic factors of each process parameter; when it is used to treat multiple organic compounds, it is more difficult to determine the most economical and effective process parameters

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  • Response surface method-based UV/H2O2 process parameter optimization method
  • Response surface method-based UV/H2O2 process parameter optimization method
  • Response surface method-based UV/H2O2 process parameter optimization method

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Embodiment Construction

[0021] The present invention will be specifically described below in conjunction with the accompanying drawings and embodiments.

[0022] The present invention is based on the UV / H of the response surface method 2 o 2 Process parameter optimization method, comprises the steps:

[0023] (1) Design the RSM mixed standard experiment for the removal of target organic matter: using matching UV / H 2 o 2 Carry out experiments in the advanced oxidation pilot plant; establish target organic matter removal models one by one and test their significance and effectiveness, and analyze their respective optimal process parameters; optimize the design of the best working conditions for the removal of various target organic compounds, and conduct model verification to determine the economic Effective process parameters;

[0024] (2) RSM mixed standard experiment of described target organic matter removal: for H 2 o 2 Dosing amount, UV dose, initial concentration of target organic matter a...

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Abstract

The invention discloses a response surface method-based UV / H2O2 process parameter optimization method which comprises the following steps: (1) designing an RSM (Response Surface Method) mixing experiment for removing a target organic matter; (2) performing the RSM mixing experiment for removing the target organic matter; (3) arranging multiple drug feeding points in a UV / H2O2 advanced oxidation pilot test device, wherein the multiple drug feeding points are respectively used for feeding H2O2 and labeling the target organic matter in a water distribution test; (4) building a target organic matter removal model, performing multi-regression fitting on experimental data by applying Design-Expert software, and building a regression equation; (5) performing variance and relevance analysis through the regression equation by adopting ANOVA (Analysis of Variance) of a response surface secondary model; and (6) determining process parameters. According to the response surface method-based UV / H2O2 process parameter optimization method, frequent adjustment of the process parameters in an actual engineering application process is simplified; and after being built, the model can be linked with an automatic control system of a UV / H2O2 advanced oxidation reactor, so as to realize automatic adjustment of the process parameters, and the cost is effectively reduced.

Description

technical field [0001] The invention relates to a water treatment UV / H 2 o 2 A method for optimizing advanced oxidation process parameters, especially involving a method of determining the treatment of various refractory organics and the required UV dose and H by using the response surface method 2 o 2 Dosage method. Background technique [0002] Advanced Oxidation Processes (AOPs), also known as deep oxidation technology, is a water treatment technology that makes full use of the activity of hydroxyl radicals (·OH) to quickly and completely oxidize organic pollutants. Among them, UV / H 2 o 2 The advanced oxidation process has a good removal effect on refractory organic substances such as chloroform, dichloroacetic acid, atrazine, o-dichlorobenzene, dimethyl phthalate, and bisphenol A in water. But in practice, UV / H 2 o 2 The process has difficulty in determining the optimal dose of UV, H 2 o 2 Large investment volume, low utilization rate and excess H 2 o 2 Diffi...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): C02F1/32C02F1/72G06F17/50
CPCC02F1/32C02F1/722G06F30/00
Inventor 贾瑞宝宋武昌孙韶华冯桂学
Owner SHANDONG WATER & WASTEWATER MONITORING CENT
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