Unlock instant, AI-driven research and patent intelligence for your innovation.

A 121.6nm narrow-band negative filter and its preparation method

A filter and narrow-band technology, applied in the field of optical filters, can solve the problems of high reflectivity in the sideband and visible light bands, reduce the quality of 121.6nm spectral lines, etc., and achieve the effect of improving quality

Inactive Publication Date: 2019-08-09
CHANGCHUN INST OF OPTICS FINE MECHANICS & PHYSICS CHINESE ACAD OF SCI
View PDF6 Cites 0 Cited by
  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0003] However, in the actual application process of the existing 121.6nm negative filter, there is a phenomenon of high reflectivity in the sideband and visible light band, thereby reducing the quality of the 121.6nm spectral line

Method used

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
View more

Image

Smart Image Click on the blue labels to locate them in the text.
Viewing Examples
Smart Image
  • A 121.6nm narrow-band negative filter and its preparation method
  • A 121.6nm narrow-band negative filter and its preparation method
  • A 121.6nm narrow-band negative filter and its preparation method

Examples

Experimental program
Comparison scheme
Effect test

preparation example Construction

[0044] The embodiment of the present invention discloses a preparation method of a 121.6nm narrow-band negative filter, see figure 1 As shown, the method includes:

[0045] Step S11: Determine the coating material of the multilayer film and the corresponding basic film system structure required for the preparation of the 121.6nm narrow-band negative filter.

[0046] In this embodiment, specifically, LaF 3 (i.e. lanthanum trifluoride) and MgF 2 (that is, magnesium fluoride) as a coating material for multilayer films. In addition, the film layer in contact with the substrate and the outermost film layer in the multilayer film are both LaF 3 film layer, and the substrate is a fused silica substrate.

[0047] In this embodiment, a first-order periodic multilayer film is preferably used to construct the basic film system. In the design of optical thin films, the bandwidth is generally adjusted by adjusting the thickness ratio of high and low refractive index materials. Since ...

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

PUM

No PUM Login to View More

Abstract

The present application discloses a 121.6nm narrow-band negative filter and a preparation method thereof. The method includes: determining the coating material and the corresponding basic film system structure of the multi-layer film required for the preparation of the 121.6nm narrow-band negative filter; Coating materials and basic film structure, calculate the corresponding equivalent admittance and phase thickness; according to the equivalent admittance and phase thickness, conduct conduction between the multilayer film and the incident medium, and between the multilayer film and the substrate in sequence. Nano-matching treatment to optimize the basic film structure to obtain the optimized film structure; according to the optimized film structure, prepare the corresponding 121.6nm narrow-band negative filter. This application can eliminate the phenomenon of high reflectivity in the sideband and visible light band due to the admittance mismatch between the multilayer film and the incident medium and substrate, and the 121.6nm negative filter prepared based on the above-mentioned optimized film structure The light sheet has lower sidebands and reflectance in the visible light band, which is conducive to improving the quality of the 121.6nm spectral line.

Description

technical field [0001] The invention relates to the technical field of optical filters, in particular to a 121.6nm narrow-band negative optical filter and a preparation method thereof. Background technique [0002] The 121.6nm spectral line is the Raman-alpha emission line of hydrogen, which has many remarkable characteristics and thus becomes the imaging target of many solar exploration missions. In order to ensure the spectral purity of the detection, it is necessary to use a 121.6nm negative filter to obtain a higher reflectance at 121.6nm. [0003] However, in the actual application process of the existing 121.6nm negative filter, there is a phenomenon that the sideband and the reflectance of the visible light band are relatively high, thereby reducing the quality of the 121.6nm spectral line. [0004] From the above, it can be seen that how to design and manufacture high-quality 121.6nm negative filters to reduce the reflectivity of sidebands and visible light bands is...

Claims

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

Application Information

Patent Timeline
no application Login to View More
Patent Type & Authority Patents(China)
IPC IPC(8): G02B5/20G02B5/26
CPCG02B5/201G02B5/26
Inventor 王孝东陈波王海峰郑鑫
Owner CHANGCHUN INST OF OPTICS FINE MECHANICS & PHYSICS CHINESE ACAD OF SCI