Flexible resistive random access memory having sol-gel thin film and preparation method thereof
A resistive memory, sol-gel technology, applied in electrical components and other directions, can solve the problems of high requirements for deposition equipment, weak bonding between resistive layer materials and plastic substrates, etc.
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[0031] The preparation method of the sol-gel film flexible resistive variable memory in this embodiment is as follows:
[0032] (1) Pretreat the PET flexible substrate 1 with oxygen plasma, and the specific process parameters are: the oxygen flow rate is 20-40cm 3 / min, the radio frequency power is 30-50W, the processing time is 1-6min, and the thickness of the PET flexible substrate 1 is 20-500μm;
[0033] (2) Using conventional sputtering equipment, deposit a layer of ITO film 2 on the PET substrate 1, the film thickness is controlled between 50nm and 200nm, such as figure 1 -shown in (a); process conditions are as follows: deposition rate is 0.02-0.06 nm / s, film thickness is 50-200nm, O 2 The / Ar flow ratio is 0.2 sccm / 20 sccm -0.8 sccm / 20 sccm, the sputtering power is 80-150W, and the sputtering pressure is 0.3-1.0Pa;
[0034] (3) Using conventional sputtering equipment, deposit a layer of Ag film 3 on the ITO film 2, the thickness of the Ag film is controlled between 5...
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