Material transmission method and device on equipment, and material transmission equipment

Abstract

The embodiment of the invention provides a conveying method and device for materials on equipment. The conveying method comprises the steps that the starting node and the final node of conveying of the materials on the equipment are determined; whether an inevitable node exists between the starting node and the final node is judged; if yes, according to the inevitable node, the starting node and the final node, the conveying path is calculated; if not, the conveying path is calculated through the starting node and the final node; and the materials are conveyed on the equipment through the conveying path. According to the conveying method and device, configuration is conducted in advance in practice, the inevitable node is designated, when manual piece conveying is needed, a system of the equipment calculates the conveying path sectionally and automatically according to the inevitable node, conveying can be completed through one time of operation, operation complexity is reduced, and human risks are lowered.

Description

technical field [0001] The invention relates to the technical field of industrial processing, in particular to a material transmission method on equipment, a material transmission device on equipment and material transmission equipment. Background technique [0002] CVD (Chemical Vapor Deposition) technology is the main technology used to prepare high-purity, high-performance solid films. In a typical CVD process, one or more vapor source atoms or molecules are mixed in the chamber, and chemical reactions occur under the action of external energy (such as heating, light, plasma, etc.) and form the desired vapor on the surface of the wafer. solid film. Usually, many by-products are also generated during the CVD process, and these by-products are carried away by the gas flow out of the chamber. Due to the advantages of fast growth rate, wide range of film formation, good reproducibility, and epitaxial growth, CVD technology is widely used in various forms of film formation, ...

AI Technical Summary

Problems solved by technology

[0004] However, when the current APCVD equipment uses algorithms to calculate the transmission path of materials for making chips, it often only considers the starting node and end node when transmitting materials, and does not consider other nodes on the equipment. However, in practical applications, for materials The accuracy of each node usually must pass through a certain node on the device, but the current transmission path calculation does not take this into account, so it cannot meet the demand.

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