Illumination optical system and lithography equipment using the same

Abstract

The invention discloses a lighting optical system and photoetching equipment employing the same. The lighting optical system comprises at least two groups of LED light source arrays, a plurality of light beam collimation components, a plurality of light beam combination components, a light beam coupling component and a light equalization component, wherein the at least two groups of LED light source arrays are different in peak wavelengths, the plurality of light beam collimation components are respectively arranged at emergent sides of each group of LED light source arrays in one-to-one correspondence so that light beams emitted from each group of LED light source arrays are transmitted and then become parallel light beams by the light beam collimation components, the plurality of light beam combination components are used for combining each parallel light beam transmitted from each light beam collimation component into a total parallel light beam, the light beam coupling component is arranged on a light path of the total parallel light beam, the light equalization component is arranged at an emergent side of the light beam coupling component, the total parallel light beam is coupled by the light beam coupling component and then irradiates the light equalization component, and parallel light beams with uniform light beam distribution is obtained at an emergent end of the light equalization component. The lighting optical system is simple in structure, high in energy utilization ratio and high in safety, and is convenient to install, debug and control.

Description

technical field [0001] The invention relates to an illumination optical system, especially an illumination optical system of a multi-wavelength LED light source array, which is mainly used in microlithography technology, and is also suitable for other optical systems that require high illumination brightness and uniformity of field of view. system. It also relates to a lithographic equipment using the illumination optical system. Background technique [0002] The microlithography technology in semiconductor manufacturing is to use the optical system to accurately project and expose the pattern on the mask onto the silicon wafer coated with photoresist. [0003] There are mainly two kinds of light sources used in the existing lighting optical system, one is a mercury lamp light source, and the other is an LED light source. [0004] However, the applicant found that the existing mercury lamp light source lighting optical system has the following shortcomings in the process o...

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Problems solved by technology

[0005] 1. In the design process, the lamphouse design of the mercury lamp light source is relatively complicated;

[0006] 2. During the debugging process of the system equipment, the mercury lamp light source lamp room is composed of the lamp room mechanical device, ellipsoidal reflector, plane reflector and mercury lamp. There are many components, resulting in many degrees of freedom during the debugging process. In the process, it is not suitable to debug to the best position, the debugging process is complicated, and the debugging cycle is long;

[0007] 3. The mercury lamp light source is dangerous

Mercury light source bulbs are filled with high-pressure mercury vapor, if improperly used and leaked, it will cause great harm to the environment and staff;

[0008] 4. Due to the large number of components in the existing mercury lamp light source lighting system, the loss of light energy in the entire light path is serious, and the utilization rate of light energy in the effective band is low

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