Lateral insulated gate bipolar transistor and its manufacturing method

A technology of bipolar transistors and insulated gates, which is applied in semiconductor/solid-state device manufacturing, semiconductor devices, electrical components, etc., and can solve problems such as long turn-off time and high power consumption

Active Publication Date: 2020-07-10
CSMC TECH FAB2 CO LTD
View PDF4 Cites 0 Cited by
  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0003] However, when the LIGBT is turned off, due to the remaining few carrier holes in the drift region of the LIGBT, the turn-off time is too long, so there is a problem of high power consumption.

Method used

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
View more

Image

Smart Image Click on the blue labels to locate them in the text.
Viewing Examples
Smart Image
  • Lateral insulated gate bipolar transistor and its manufacturing method
  • Lateral insulated gate bipolar transistor and its manufacturing method

Examples

Experimental program
Comparison scheme
Effect test

Embodiment Construction

[0021] In order to facilitate the understanding of the present invention, the present invention will be described more fully below with reference to the associated drawings. A preferred embodiment of the invention is shown in the drawings. However, the present invention can be embodied in many different forms and is not limited to the embodiments described herein. Rather, these embodiments are provided so that the disclosure of the present invention will be thorough and complete.

[0022] It should be noted that when an element is referred to as being “fixed” to another element, it can be directly on the other element or there can also be an intervening element. When an element is referred to as being "connected to" another element, it can be directly connected to the other element or intervening elements may also be present. The terms "vertical," "horizontal," "upper," "lower," "left," "right," and similar expressions are used herein for purposes of illustration only.

[0...

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to view more

PUM

No PUM Login to view more

Abstract

The present invention relates to a lateral insulated gate bipolar transistor and a manufacturing method thereof. The lateral insulated gate bipolar transistor includes a substrate, an anode terminal and a cathode terminal on the substrate, and an anode terminal located between the anode terminal and the cathode terminal. Drift region and gate, the anode terminal includes an N-type buffer zone on the substrate, a P well in the N-type buffer zone, an N+ region in the P well, and a trench surrounded by the P well part above the N+ region trench, polysilicon in the trench, P+ junctions on both sides of the trench, and N+ junctions on both sides of the P+ junction. The present invention injects a large number of holes during forward conduction, forming a significant conductance modulation effect to reduce the on-state resistance; on the other hand, when the device is turned off, N+ can quickly absorb minority carrier holes, greatly reducing the turn-off loss.

Description

technical field [0001] The invention relates to semiconductor technology, in particular to a lateral insulated gate bipolar transistor and a manufacturing method for the lateral insulated gate bipolar transistor. Background technique [0002] Lateral Insulated-Gate Bipolar Transistor (LIGBT) is often used in the output stage of high-voltage power drive integrated circuits, and the single carrier of lateral double-diffused metal-oxide-semiconductor field-effect transistors (LDMOS) reduces on-resistance In comparison, the LIGBT structure can bring lower on-resistance due to the conductance modulation effect formed by the bicarrier injection of electrons and holes. [0003] However, when the LIGBT is turned off, due to the small number of carrier holes remaining in the drift region of the LIGBT, the turn-off time is relatively long, so there is a problem of high power consumption. Since the on-resistance and off-time have an inverse relationship with the hole concentration, ho...

Claims

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to view more

Application Information

Patent Timeline
no application Login to view more
Patent Type & Authority Patents(China)
IPC IPC(8): H01L21/331H01L29/739
CPCH01L29/66325H01L29/7393H01L29/7394H01L29/0834H01L29/0623H01L29/407H01L21/027H01L21/31105H01L21/32055H01L21/324H01L21/7624H01L21/7806H01L21/823892H01L29/1058H01L29/1079H01L29/4236H01L29/66477H01L29/739H01L29/78H01L29/1095H01L29/41708
Inventor 祁树坤
Owner CSMC TECH FAB2 CO LTD
Who we serve
  • R&D Engineer
  • R&D Manager
  • IP Professional
Why Eureka
  • Industry Leading Data Capabilities
  • Powerful AI technology
  • Patent DNA Extraction
Social media
Try Eureka
PatSnap group products