Preparation method of monolayer lattice
Patent Information
- Authority / Receiving Office
- CN · China
- Patent Type
- Patents(China)
- Current Assignee / Owner
- SOUTH CHINA NORMAL UNIVERSITY
- Publication Date
- 2020-12-01
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Abstract
Description
technical field
[0001] The invention relates to the field of crystal lattices, in particular to a preparation method of a single-layer lattice. Background technique
[0002] Nanostructures have a wide range of applications, such as 3D printing, fabrication of optical filters, waveguides, sensors, metal periodic structures for enhanced Raman scattering, etc. Traditional focused ion beam etching and electron beam etching directly fabricate nanostructures on the substrate, which is costly, low yield, and time-consuming. Since the nanosphere etching technology was proposed, nanostructures can be produced in a large area at a low cost in a short period of time. This method is based on a single-layer array of nanospheres arranged in an orderly manner as a template for the final structure. The advantages and disadvantages of the template are great. The degree determines the quality of the nanostructure. Therefore, it is very critical to fabricate a large-area single-layer templat...