Preparation method of monolayer lattice

A single-layer crystal, target substrate technology, applied in the field of lattice, can solve the problems of broken structure, high technical requirements for film production, film structure defects, etc., to achieve the effect of improving repeatability, high adjustability and reducing cracks
CN107604433BActive Publication Date: 2020-12-01SOUTH CHINA NORMAL UNIVERSITY

Patent Information

Authority / Receiving Office
CN · China
Patent Type
Patents(China)
Current Assignee / Owner
SOUTH CHINA NORMAL UNIVERSITY
Publication Date
2020-12-01

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Abstract

The present invention relates to a single-layer crystal lattice preparation method, which comprises: placing a substrate and a target substrate in a container with a water discharging switch, whereinthe upper surface of the substrate is inclined, and the target substrate is placed on the substrate; obliquely placing a conduction slide so as to make the lower end of the conduction slide bear against the target substrate; adding deionized water, a binder solution and a surfactant solution into the container to form a boundary line between the conduction slide and the liquid surface; adding a small ball suspension liquid at the boundary line between the conduction slide and the liquid surface in a dropwise manner, wherein the small balls are spread on the liquid surface to form a film structure; taking out the conduction slide, adjusting the film structure to make the film structure be positioned above the target substrate, opening the water discharging switch after the liquid surface isstable, and making the liquid surface descend so as to make the film structure be positioned at the target substrate; and taking out the target substrate, placing into an environment filled with absolute ethanol, and drying to obtain the single-layer crystal lattice. According to the present invention, the preparation method has advantages of simple and convenient operation process, high repeatability, and less lattice defects.
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Description

technical field

[0001] The invention relates to the field of crystal lattices, in particular to a preparation method of a single-layer lattice. Background technique

[0002] Nanostructures have a wide range of applications, such as 3D printing, fabrication of optical filters, waveguides, sensors, metal periodic structures for enhanced Raman scattering, etc. Traditional focused ion beam etching and electron beam etching directly fabricate nanostructures on the substrate, which is costly, low yield, and time-consuming. Since the nanosphere etching technology was proposed, nanostructures can be produced in a large area at a low cost in a short period of time. This method is based on a single-layer array of nanospheres arranged in an orderly manner as a template for the final structure. The advantages and disadvantages of the template are great. The degree determines the quality of the nanostructure. Therefore, it is very critical to fabricate a large-area single-layer templat...

Claims

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