System and method for monitoring parameters of a semiconductor factory automation system

An automation system and semiconductor technology, applied in general control systems, semiconductor/solid-state device manufacturing, semiconductor/solid-state device testing/measurement, etc., can solve problems such as difficult to identify automation systems, automation system errors and deviations, cumbersome and slow
CN107690604AActive Publication Date: 2018-02-13KLA TENCOR TECH CORP
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Patent Information

Authority / Receiving Office
CN · China
Current Assignee / Owner
KLA TENCOR TECH CORP
Publication Date
2018-02-13

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Abstract

A system for monitoring one or more conditions of an automation system of a semiconductor factory includes one or more instrumented substrates, one or more sealable containers and one or more system servers. The one or more instrumented substrates include one or more sensors. The one or more sensors measure one or more conditions of the one or more instrumented substrates as the one or more sealable containers transport the one or more instrumented substrates through the semiconductor factory. The one or more sealable containers also receive sensor data from the one or more sensors included onthe one or more instrumented substrates. The one or more system servers are configured to receive the sensor data from the one or more sealable containers. The one or more servers are configured to identify one or more deviations in the measured one or more conditions.
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Description

[0001] Cross References to Related Applications

[0002] This application claims under 35 U.S.C. §119(e) named Mor Azarya, Michael D. Brain, Ami Appelbaum, The inventors, Shai Mark and Arie Hoffman, are entitled "Automated Measurement and Monitoring of Leveling, Teaching, Alignment, Cleanliness, and Method of Healthy Parameters (METHOD TOAUTOMATICALLY MEASURE AND MONITOR PARAMETERS SUCH AS THE LEVELING, TEACHING, ALIGNMENT, CLEANLINESS, AND HEALTH OF SEMICONDUCTOR FACTORY AUTOMATION SYSTEMSAND WAFER CHARGER) "US Provisional Application No. 62 / 180 on June 16, 2015, Claim to the Provisional Application, the entirety of which is hereby incorporated by reference. technical field

[0003] The present invention relates generally to monitoring conditions of a semiconductor factory automation system, and more particularly, the present invention relates to an instrumented substrate for monitoring parameters of a semiconductor factory automation system. Background technique [0004...

Claims

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