High-Al component AlxGa(1-x)N ternary alloy microcrystal sphere and preparation method thereof
A technology of ternary alloys and microcrystalline balls, applied in chemical instruments and methods, single crystal growth, crystal growth, etc., can solve problems such as high cost, spontaneous phase separation, unsuitable for commercial development, etc., to achieve inhibition of phase separation, The effect of good repeatability and simple preparation process
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Embodiment 1
[0047] A high Al component Al x Ga 1-x N ternary alloy microcrystalline ball, Al with x=0.77 x Ga 1-x The diffraction angles of the characteristic peaks (100), (002) and (101) of the XRD pattern of the N semiconductor alloy are between the diffraction angles of the wurtzite structure AlN and GaN, indicating that the product is an AlGaN crystal with a wurtzite structure, see figure 2 .
[0048] For high Al component Al x Ga 1-x Scanning analysis of N(x=0.77) microcrystalline spheres, see the scanning electron microscope picture image 3 , It can be drawn from the figure that Al 0.77 Ga 0.23 The morphology of the N ternary alloy microcrystalline ball, the microcrystalline ball has a regular and uniform spherical structure, and its average diameter is 5.0 μm.
[0049] A high Al component Al x Ga 1-x The preparation method of N ternary alloy microcrystalline ball includes the following steps:
[0050] Step 1. Pre-deposit thin aluminum powder
[0051] (1) Ultrasonic treatment of the silic...
Embodiment 2
[0065] A high Al component Al x Ga 1-x N ternary alloy microcrystalline ball, Al x Ga 1-x N semiconductor alloy with wurtzite structure AlGaN crystal. The microcrystalline ball has a regular and uniform spherical structure with an average diameter of 5.0 μm.
[0066] A high Al component Al x Ga 1-x The preparation method of N ternary alloy microcrystalline ball includes the following steps:
[0067] Step 1. Pre-deposit thin aluminum powder
[0068] (1) Ultrasonic treatment of the silicon substrate with ethanol, and after cleaning, an ultrasonic silicon substrate is obtained;
[0069] Add aluminum powder with a purity of 99.999 and an average particle size of 10 μm into methanol, and perform ultrasonic vibration for 60 minutes. When the aluminum powder is uniformly dispersed, an ultrasonic aluminum powder mixture is obtained;
[0070] (2) Put the ultrasonic silicon substrate into the ultrasonic aluminum powder mixture, and air dry to obtain a silicon substrate deposited with a thin laye...
Embodiment 3
[0082] A high Al component Al x Ga 1-x N ternary alloy microcrystalline ball, Al x Ga 1-x N semiconductor alloy with wurtzite structure AlGaN crystal. The microcrystalline ball has a regular and uniform spherical structure with an average diameter of 5.0 μm.
[0083] A high Al component Al x Ga 1-x The preparation method of N ternary alloy microcrystalline ball includes the following steps:
[0084] Step 1. Pre-deposit thin aluminum powder
[0085] (1) Ultrasonic treatment of the silicon substrate with deionized water, and after cleaning, an ultrasonic silicon substrate is obtained;
[0086] Add aluminum powder with a purity of 99.999 and an average particle size of 8 μm into methanol, and perform ultrasonic vibration for 40 minutes. When the aluminum powder is uniformly dispersed, an ultrasonic aluminum powder mixture is obtained;
[0087] (2) Put the ultrasonic silicon substrate into the ultrasonic aluminum powder mixture and air dry to obtain a silicon substrate deposited with a thi...
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