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Centering Fixtures for Electrostatic Chuck Systems

An electrostatic chuck and chuck technology, applied in general control systems, control/regulation systems, circuits, etc., can solve problems such as affecting calibration

Active Publication Date: 2021-10-15
GLOBALFOUNDRIES U S INC MALTA
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

Human Variation Can Negatively Affect Calibration

Method used

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  • Centering Fixtures for Electrostatic Chuck Systems
  • Centering Fixtures for Electrostatic Chuck Systems
  • Centering Fixtures for Electrostatic Chuck Systems

Examples

Experimental program
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Embodiment Construction

[0022] Provided is a centering fixture for automatically centering a wafer relative to a chuck or platform of an electrostatic chuck (ESC) system. By removing human variability in wafer centering, centering fixtures allow for more accurate alignment of automated handling systems for semiconductor processing systems. In this way, processing steps such as uniform etching of the wafer edge can be carried out in a more reliable manner. Although the teachings of the present invention will be described with a circular centering fixture accommodating a circular chuck versus a round wafer, it is emphasized that the centering fixture can be applied to other shapes of wafers and chucks, such as: Square, rectangular, etc.

[0023] Referring to the drawings, provided is a centering fixture 100 for centering a round wafer on a round chuck. figure 1 show perspective and figure 2 shows a plan view of the centering fixture 100, and image 3 An exploded perspective view of the centering ...

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PUM

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Abstract

The invention relates to a centering fixture for an electrostatic chuck system, and provides a centering fixture for centering a wafer on a chuck. The centering fixture includes a body including an upper surface, a lower surface, an inner peripheral edge and an outer peripheral edge. A chuck seat is placed in the lower portion of the inner periphery and is configured to engage the body with the chuck. A wafer seat is disposed in the upper portion of the inner periphery above the chuck seat, the wafer seat is configured to receive and center the wafer on the chuck. The centering fixture ensures that the wafer is centered relative to the chuck for automated handling system calibration. The wafer, body, chuck, chuck seat and wafer seat can be circular.

Description

technical field [0001] The present invention relates to semiconductor manufacturing and, more particularly, to centering fixtures for electrostatic chuck systems and methods of training automated handling systems. Background technique [0002] In the fabrication of semiconductor wafers, individual wafers are transported between a large variety of semiconductor processing systems to perform different fabrication processes on the wafers. The work performed by each chamber can be different, such as: deposition, etching, etc. Wafers are moved within and between processing systems by automated handlers. The automated handler picks the wafer from one processing system and moves it to or into the next processing system. [0003] Certain processing systems include specific work chambers that include an electrostatic chuck (ESC) system to hold the wafer in a desired position. An ESC system may include a chuck or stage that may be electrostatically charged to hold the wafer in plac...

Claims

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Application Information

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Patent Type & Authority Patents(China)
IPC IPC(8): H01L21/683H01L21/68
CPCH01L21/68H01L21/6833H01L21/67748H01L21/6831H01L21/68735B25J9/1692G05B2219/49113
Inventor 罗纳德尔·R·包宜二世马修·J·包默巴迪尔
Owner GLOBALFOUNDRIES U S INC MALTA