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Rotary plate positioning device, loading transmission system and plasma processing equipment

Active Publication Date: 2018-03-20
BEIJING NAURA MICROELECTRONICS EQUIP CO LTD
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0008] Since the above-mentioned turntable positioning device can only locate the origin of the turntable, but cannot monitor whether the station of the turntable reaches the predetermined position during the process, it is impossible to know the abnormal position of the station of the turntable in time, which will not only cause the work process to be unable to continue , and may also cause mechanical failure, thereby reducing the safety and stability of plasma processing equipment
[0009] Although the motion controller of the motor can indirectly know the rotation angle of the turntable by detecting the rotation angle of the motor, the rotation angle of the turntable will often be deviated due to mechanical errors due to the rotation mechanism itself and the transmission between the turntable and the turntable. As a result, during the process, the motor rotates in place but the position of the turntable is not in place, or because the edge of the turntable will amplify the angle deviation of the turntable, the angle deviation of the turntable rotation mechanism does not exceed the allowable range, while the angle of the turntable edge When the deviation exceeds the allowable range
When the above two situations occur, the motion controller of the motor will still provide a feedback signal indicating that the position of the turntable is in place, resulting in a wrong judgment on whether the position of the turntable is in place, which will also cause mechanical failure, thereby reducing the plasma processing efficiency. Device Security and Stability

Method used

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  • Rotary plate positioning device, loading transmission system and plasma processing equipment
  • Rotary plate positioning device, loading transmission system and plasma processing equipment
  • Rotary plate positioning device, loading transmission system and plasma processing equipment

Examples

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Embodiment 1

[0045] Figure 4A It is a top view of a turntable positioning device provided in Embodiment 1 of the present invention. Figure 4B for Figure 4A Side view on A upward. Please also refer to Figure 4A with Figure 4B , in this embodiment, the turntable 50 is provided with stations 51 , the number of stations 51 is multiple, and arranged at intervals along the circumference of the turntable 50 .

[0046] In the position detection unit, the first identification module includes a first protrusion 54, the first protrusion 54 is arranged on the outer peripheral wall of the turntable 50, and the number and position correspond to the number and position of the station 51 one by one; the first detection The module includes a first distance sensor 52 and a first controller (not shown in the figure), wherein the first distance sensor 52 is arranged on the periphery of the outer peripheral wall of the turntable 50, for when the turntable 50 rotates from its origin position, the A pa...

Embodiment 2

[0058] Figure 6A It is a top view of the turntable positioning device provided by Embodiment 2 of the present invention. Figure 6B for Figure 6A Sectional view along line A-A in middle. Please also refer to Figure 6A with Figure 6B , in this embodiment, the turntable 50 is provided with stations 51 , the number of stations 51 is multiple, and arranged at intervals along the circumference of the turntable 50 .

[0059] In the in-position detection unit, the first identification module includes a first through hole 61 that is arranged on the bearing surface where the station 51 of the turntable 50 is located (that is, the surface of the turntable for carrying workpieces) and penetrates through the thickness of the turntable 50, and The quantity and the position of the first through hole 61 correspond to the quantity and the position of the station 51 one by one; The radiation sensor 63 includes a transmitting end and a receiving end respectively arranged on the upper a...

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Abstract

The invention provides a rotary plate positioning device, a loading transmission system and plasma processing equipment. The rotary plate positioning device comprises a rotary plate, an origin detecting unit and an in-place detecting unit. A station is arranged on the rotary plate for bearing a workpiece; the origin detecting unit is used for detecting the origin position of the rotary plate; thein-place detecting unit comprises a first detecting module and a first identification module, wherein the first identification module is used for identifying the position, on the rotary plate, of theidentified station; and the first detecting module is used for determining whether the station reaches a predetermined position or not by detecting the first identification module. The rotary plate positioning device provided by the invention can be used for monitoring whether the station of the rotary plate reaches the predetermined position or not, so that the position abnormity appearing in thestation of the rotary plate can be timely obtained.

Description

[0001] The invention is a divisional application with application number: 201310406341.4, application date: September 9, 2013, and title of invention: turntable positioning device, loading transmission system and plasma processing equipment. technical field [0002] The invention belongs to the field of semiconductor equipment manufacturing, and in particular relates to a turntable positioning device, a loading transmission system and plasma processing equipment. Background technique [0003] With the continuous development of microelectronics technology, the competition of related production enterprises is becoming more and more fierce. Reducing costs and improving production efficiency are common means to improve the competitiveness of enterprises. For example, in order to improve production efficiency and reduce production cost, during the process of the process, the loading and conveying system is used to implement different processes on multiple substrates at the same ti...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): H01L21/67H01L21/687
CPCH01L21/67H01L21/67259H01L21/677H01L21/67742H01L21/68H01L21/68764H01L21/68771
Inventor 张文刘菲菲
Owner BEIJING NAURA MICROELECTRONICS EQUIP CO LTD
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