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Turntable positioning device, loading transfer system and plasma processing equipment

A technology of positioning device and predetermined position, which is used in conveyor objects, transportation and packaging, semiconductor/solid-state device manufacturing, etc., can solve problems such as not in place, wrong judgment of whether the turntable station is in place, mechanical failure, etc., to improve safety. and stability, avoid mechanical failure, and ensure the effect of normal operation

Active Publication Date: 2017-09-29
BEIJING NAURA MICROELECTRONICS EQUIP CO LTD
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0007] Since the above-mentioned turntable positioning device can only locate the origin of the turntable, but cannot monitor whether the station of the turntable reaches the predetermined position during the process, it is impossible to know the abnormal position of the station of the turntable in time, which will not only cause the work process to be unable to continue , and may also cause mechanical failure, thereby reducing the safety and stability of plasma processing equipment
[0008] Although the motion controller of the motor can indirectly know the rotation angle of the turntable by detecting the rotation angle of the motor, the rotation angle of the turntable will often be deviated due to mechanical errors due to the rotation mechanism itself and the transmission between the turntable and the turntable. As a result, during the process, the motor rotates in place but the position of the turntable is not in place, or because the edge of the turntable will amplify the angle deviation of the turntable, the angle deviation of the turntable rotation mechanism does not exceed the allowable range, while the angle of the turntable edge When the deviation exceeds the allowable range
When the above two situations occur, the motion controller of the motor will still provide a feedback signal indicating that the position of the turntable is in place, resulting in a wrong judgment on whether the position of the turntable is in place, which will also cause mechanical failure, thereby reducing the plasma processing efficiency. Device Security and Stability

Method used

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  • Turntable positioning device, loading transfer system and plasma processing equipment
  • Turntable positioning device, loading transfer system and plasma processing equipment
  • Turntable positioning device, loading transfer system and plasma processing equipment

Examples

Experimental program
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Embodiment 1

[0044] Figure 4A It is a top view of a turntable positioning device provided in the first embodiment of the present invention. Figure 4B for Figure 4A Side view in A upwards. Please refer to Figure 4A with Figure 4B In this embodiment, there are stations 51 on the turntable 50, and the number of stations 51 is multiple, and they are arranged at intervals along the circumference of the turntable 50.

[0045] In the in-position detection unit, the first identification module includes a first protrusion 54 which is arranged on the outer peripheral wall of the turntable 50, and the number and position of the first protrusion 54 correspond to the number and position of the station 51; The module includes a first distance sensor 52 and a first controller (not shown in the figure). The first distance sensor 52 is arranged on the periphery of the outer peripheral wall of the turntable 50 to face the first distance sensor when the turntable 50 rotates from its origin position. A path...

Embodiment 2

[0057] Figure 6A It is a top view of the turntable positioning device provided in the second embodiment of the present invention. Figure 6B for Figure 6A A cross-sectional view along the line A-A. Please refer to Figure 6A with Figure 6B In this embodiment, there are stations 51 on the turntable 50, and the number of stations 51 is multiple, and they are arranged at intervals along the circumference of the turntable 50.

[0058] In the in-position detection unit, the first identification module includes a first through hole 61 provided on the bearing surface where the station 51 of the turntable 50 is located (that is, the surface of the turntable used to carry the workpiece) and penetrates the thickness of the turntable 50, and The number and positions of the first through holes 61 correspond to the number and positions of the stations 51 one-to-one; the first detection module includes a first pair of radiation sensors 63 and a first controller (not shown in the figure), w...

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Abstract

A rotary table positioning device, a load transmission system and a plasma processing device. The rotary table positioning device comprises a rotary table (50), an in-position detection unit and an original-point detection unit. The in-position detection unit comprises a first identification module and a first detection module. The first identification module is used for identifying the position of a work station on the rotary table, and the first detection module is used for judging whether the work station reaches a pre-set position by detecting the first identification module. The original-point detection unit comprises a second identification module and a second detection module. The second identification module is used for identifying an original-point position, and the second detection module is used for judging whether the work station reaches the original-point position by detecting the second detection module. The provided rotary table positioning device, load transmission system and plasma processing device can learn whether an abnormal position appears in the work station of a rotary table, which can not only guarantee a normal working process, but can also avoid the occurrence of mechanical failures, so that the security and stability of plasma processing can be improved.

Description

Technical field [0001] The invention belongs to the field of semiconductor equipment manufacturing, and specifically relates to a turntable positioning device, a loading transmission system and a plasma processing equipment. Background technique [0002] With the continuous development of microelectronics technology, the competition among related manufacturing companies has become more and more fierce. Lowering costs and improving production efficiency are commonly used methods to improve corporate competitiveness. For example, in order to improve production efficiency and reduce production costs, in the process of the process, the loading and transmission system is used to implement different processes on multiple substrates at the same time to meet the increasing market demand. [0003] figure 1 It is a schematic diagram of an existing loading transmission system. Figure 2A for figure 1 Top view of the middle reaction chamber. Figure 2B For the edge Figure 2A A cross-sectional...

Claims

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Application Information

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Patent Type & Authority Patents(China)
IPC IPC(8): H01L21/68H01L21/677H01L21/67
CPCH01L21/67H01L21/67259H01L21/677H01L21/67742H01L21/68H01L21/68764H01L21/68771
Inventor 张文刘菲菲
Owner BEIJING NAURA MICROELECTRONICS EQUIP CO LTD
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