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Wet tail gas treatment device using negative pressure device

A tail gas treatment and negative pressure device technology, applied in chemical instruments and methods, dispersed particle separation, separation methods, etc., can solve problems such as tail gas leakage, achieve the effects of avoiding tail gas leakage, easy sealing, and solving tail gas leakage

Inactive Publication Date: 2018-06-26
PNC PROCESS SYSTEMS CO LTD
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

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Problems solved by technology

[0006] In view of this, the purpose of the present invention is to provide a wet exhaust processor using a negative pressure device, which can effectively solve the problem that traditional wet exhaust processors are prone to exhaust gas leakage

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  • Wet tail gas treatment device using negative pressure device

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Embodiment Construction

[0024] The embodiment of the invention discloses a wet exhaust processor using a negative pressure device to effectively solve the problem that the wet exhaust processor using the negative pressure device is prone to exhaust gas leakage.

[0025] The following will clearly and completely describe the technical solutions in the embodiments of the present invention with reference to the accompanying drawings in the embodiments of the present invention. Obviously, the described embodiments are only some, not all, embodiments of the present invention. Based on the embodiments of the present invention, all other embodiments obtained by persons of ordinary skill in the art without making creative efforts belong to the protection scope of the present invention.

[0026] see figure 1 , figure 1 A schematic structural diagram of a wet exhaust gas processor using a negative pressure device provided in an embodiment of the present invention.

[0027] In a specific embodiment, this embo...

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Abstract

The present invention discloses a wet tail gas treatment device using a negative pressure device. The wet tail gas treatment device comprises a water washing chamber for washing tail gas, a jet deviceand a high pressure providing device, wherein the high pressure output port of the high pressure providing device is communicated to the high pressure inlet of the jet device, and the gas inlet of the jet device is communicated to the gas outlet of the water washing chamber. According to the present invention, by using the jet device and the high pressure providing device, the tail gas does not pass through the high pressure providing device after the tail gas outflows from the gas outlet of the water washing chamber so as not to provide the high sealing requirement at the high pressure providing device position, and the high pressure fluid drives the gas to flow in the jet device without the moving component and the movable sealing so as to easily seal, such that the tail gas leakage canbe effectively avoided; and the problem of easy tail gas leakage of the traditional fan suction type wet tail gas treatment device can be effectively solved with the wet tail gas treatment device using the negative pressure device.

Description

technical field [0001] The invention relates to the technical field of tail gas treatment, in particular to a wet tail gas processor using a negative pressure device. Background technique [0002] Pan-semiconductor manufacturing industries such as semiconductors / liquid crystal panels / photovoltaic solar energy will use water-washing exhaust processors to treat toxic and harmful process waste gases dissolved in water such as chlorine, hydrogen chloride, and ammonia, so that their emission concentrations are lower than the national standard "Air Pollution The maximum allowable emission concentration value of air pollutants stipulated in the Comprehensive Emission Standard of Wastewater, among which the water-washing exhaust processor is also called wet exhaust processor. [0003] At present, a wet exhaust gas processor is usually used, which is a negative pressure exhaust gas processor. The current common wet exhaust gas treatment device includes a washing chamber, a liquid sup...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): B01D53/14B01D53/18B01D53/78B01D53/68B01D53/58
CPCB01D53/14B01D53/18B01D53/58B01D53/68B01D53/78
Inventor 吴海华徐力连海洲
Owner PNC PROCESS SYSTEMS CO LTD