Looking for breakthrough ideas for innovation challenges? Try Patsnap Eureka!

Stereolithography machine with inclined tank

A technology of three-dimensional lithography and printing presses, which can be used in manufacturing tools, processing platforms/substrates, processing driving devices, etc., and can solve problems such as unfavorable processing time and complex structure.

Active Publication Date: 2018-06-26
DWS SRL
View PDF6 Cites 1 Cited by
  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0014] However, such last solutions of the prior art foresee a more complex construction of the same stereolithographic printing machine, since it is necessary to foresee additional elements and relative movement systems with respect to the aforementioned stereolithographic printing machine
Furthermore, disadvantageously, the aforementioned leveling device is known to intervene only after lifting the formwork plate to a sufficient height to allow the same leveling device to slide through the space defined between this plate and the box below
Therefore, although a stereolithographic printing machine including the aforementioned leveling device can reduce the production time of three-dimensional objects relative to a stereolithographic printing machine without a leveling device, in any case, the precise sequence of the above-mentioned operations will disadvantageously lead to impossible Neglected processing time

Method used

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
View more

Image

Smart Image Click on the blue labels to locate them in the text.
Viewing Examples
Smart Image
  • Stereolithography machine with inclined tank
  • Stereolithography machine with inclined tank
  • Stereolithography machine with inclined tank

Examples

Experimental program
Comparison scheme
Effect test

Embodiment Construction

[0036] The stereolithography press of the invention according to a first preferred embodiment is shown in figure 1 and figure 2 , where the stereolithography machine is indicated by 1 as a whole.

[0037] As can be seen from such figures, the stereolithography machine 1 comprises a support structure 1a adapted to be placed on a substantially horizontal support plane π, such as for example the upper surface of a laboratory bench. As will become clear hereinafter, the reference direction X defined more precisely in the rest of the description is identified on the aforementioned support plane π.

[0038] Such a support structure 1a is configured to support a tank 2 provided with a bottom 2a and side walls 2b for containing a photosensitive liquid substance, preferably a photosensitive resin.

[0039] The bottom 2a is transparent in order to allow the passage of light beams from a light source, not shown in the figure but known per se, arranged below the box 2 . Such beams are...

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

PUM

No PUM Login to View More

Abstract

A stereolithography machine that comprises a support structure arranged resting on a substantially horizontal support plane (Pi) having a reference direction (X), a tank coupled with the support structure and provided with a bottom, a support group coupled with the support structure for the movement above the tank of a modelling plate so that the modelling surface of such a modelling plate faces,substantially in a parallel position, the bottom. The stereolithography machine provides that, at least during the execution of the stereolithography process for the production of a three-dimensionalobject, the tank, the support group and the modelling plate are coupled with the support structure so that the modelling surface and the bottom lie on planes (Pi1, Pi2) intersecting the support plane(Pi) defining with this support plane angles of intersection Alpha1 and Alpha2, respectively, and defining with this support plane (Pi) lines of intersection (Gamma1, Gamma2) respectively, orthogonalto the reference direction (X).

Description

technical field [0001] The present invention relates to a stereolithographic printing machine capable of speeding up and simplifying the stereolithographic printing process for manufacturing three-dimensional objects, in particular Stereolithographic process for color change of liquid substances. Background technique [0002] Stereolithographic printing machines are well known for producing complex three-dimensional objects from photosensitive liquid substances, preferably photosensitive resins, which are polymerized in layers by light beams. To simplify the description, in the following, the term "resin" will be used simply to refer to photosensitive resin or any other photosensitive liquid substance equivalent to photosensitive resin used in stereolithography process for manufacturing three-dimensional objects. [0003] It is also known that a stereolithographic printing machine comprises a tank adapted to contain the above-mentioned resin, and a model plate facing the bo...

Claims

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

Application Information

Patent Timeline
no application Login to View More
Patent Type & Authority Applications(China)
IPC IPC(8): B29C64/20B29C64/357B33Y30/00B33Y40/00
CPCB33Y30/00B33Y40/00B29C64/124B29C64/20B33Y10/00B29C64/245B29C64/364B29C64/227B29C64/357B29C64/268B29C64/25
Inventor S·赞纳惹R·布萨托
Owner DWS SRL
Features
  • Generate Ideas
  • Intellectual Property
  • Life Sciences
  • Materials
  • Tech Scout
Why Patsnap Eureka
  • Unparalleled Data Quality
  • Higher Quality Content
  • 60% Fewer Hallucinations
Social media
Patsnap Eureka Blog
Learn More

Browse by: Latest US Patents, China's latest patents, Technical Efficacy Thesaurus, Application Domain, Technology Topic, Popular Technical Reports.

© 2025 PatSnap. All rights reserved.Legal|Privacy policy|Modern Slavery Act Transparency Statement|Sitemap|About US| Contact US: help@patsnap.com