Manufacturing method for color filter substrate and color filter substrate

Abstract

The invention provides a manufacturing method for a color filter substrate and the color filter substrate. The manufacturing method for the color filter substrate comprises the following steps that the substrate is provided, wherein the substrate comprises multiple pixel areas which are distributed in an array and non-pixel areas located among the adjacent pixel areas; transparent light resistancethin film is formed on the substrate; the light resistance thin film in the non-pixel areas is subjected to carbonization treatment to obtain a light resistance layer, wherein the light resistance layer comprises transparent parts in all the pixel areas and light shielding parts in all the non-pixel areas; a color filter layer is formed on the light resistance layer. Light shielding is conductedthrough the light shielding parts in the light resistance layer, the function of a black matrix is achieved, the color filter layer is subjected to bottom flatting through the transparent parts in thelight resistance layer, cattle horns or corner segment differences on the color filter layer are avoided, and the product quality is guaranteed.

Description

technical field [0001] The invention relates to the field of display technology, in particular to a method for manufacturing a color filter substrate and the color filter substrate. Background technique [0002] A Liquid Crystal Display (LCD) has many advantages such as a thin body, power saving, and no radiation, and has been widely used. Such as: LCD TV, mobile phone, personal digital assistant (PDA), digital camera, computer screen or notebook computer screen, etc., occupy a dominant position in the field of flat panel display. [0003] Most of the liquid crystal displays currently on the market are backlight liquid crystal displays, which include a liquid crystal display panel and a backlight module. The working principle of the liquid crystal display panel is to pour liquid crystal molecules between the thin film transistor array substrate (ThinFilm Transistor Array Substrate, TFT Array Substrate) and the color filter substrate (ColorFilter, CF), and apply a driving vo...

AI Technical Summary

Problems solved by technology

Among them, such as figure 1 As shown, the color filter substrate generally includes a substrate 10, a black matrix 20 (Black Matrix, BM) formed on the substrate 10, a color filter layer 30, and a transparent electrode layer 40 formed on the color filter layer 30 And the spacer 50 formed on the transparent electrode layer 40; wherein, the color filter layer 30 includes a plurality of filter units 31 of different colors, for example, red, green and blue photosensitive resins are used to form red, green and blue respectively. The blue filter unit, the black matrix 20 is used to define the boundary between each filter unit 31, in order to prevent light leakage between adjacent filter units 31, the edge of the filter unit 31 is usually overlapped with the black matrix 20, At this time, due to the existence of the lower black matrix 20, when the edges of each filter unit 31 are overlapped by the black matrix 20, it is easy to form horns or corner differences, which will affect the subsequent process, such as causing the transparent electrode layer 40 of the subsequent process to break. , affecting product quality

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