A method and process for controlling the growth of polysilicon ingot

A growth control and polycrystalline ingot casting technology, which is applied in polycrystalline material growth, single crystal growth, single crystal growth, etc., can solve the problem of low utilization of polycrystalline silicon ingots, affecting the yield of polycrystalline silicon ingots, and easy melting of the seed layer, etc. problem, to achieve the effect of reducing over-melting phenomenon, reducing the thickness of the red zone, and less air bubbles
CN108425148BActive Publication Date: 2020-09-04南通友拓新能源科技有限公司

Patent Information

Authority / Receiving Office
CN · China
Patent Type
Patents(China)
Current Assignee / Owner
南通友拓新能源科技有限公司
Publication Date
2020-09-04

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Abstract

The invention discloses a polycrystalline silicon cast ingot growth control method and a process. A temperature difference between the top and the bottom of a crucible is adopted as a newly introducedparameter delta t for controlling growth with a polycrystalline silicon cast ingot growth process; in the preparation process of cast ingots, a curve delta t is firstly increased and then reduced, and is further increased and finally reduced to 0; when the value delta t reaches the maximum peak, a silicon material inside the crucible starts to be molten, the value delta t has a peak of minimal values when the silicon material is completely molten, the temperature of the peak of the value delta t cannot be lower than 160 DEG C, once the temperature is lower than 160 DEG C, a melt-through phenomenon can be caused for a seed crystal layer at the bottom of the crucible, a red zone can be increased, and at the same time the red zone at a corner of the crucible can extend upwards along the wallof the crucible. A delta t peak judging method can be used as a criterion of the silicon ingot casting process, the polycrystalline silicon cast ingot growth process is provided, and the polycrystalline silicon cast ingot growth control method has the advantages that the thickness of a red zone in polycrystalline silicon is reduced, the quality of the polycrystalline silicon is improved, the utilization efficiency of the polycrystalline silicon is improved, and the cost is lowered.
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Description

technical field

[0001] The patent of the invention relates to the field of polysilicon production, in particular to a polysilicon ingot growth control method and process. Background technique

[0002] As of 2017, the country's energy consumption is still dominated by non-renewable energy, and renewable resources account for less than 10% of the total energy. Therefore, all countries are supporting the development of clean energy, the most prominent of which is solar energy. There are three main types of solar cells: crystalline silicon, thin film and concentrating solar cells. The crystalline silicon cell is the most used by people, which has the advantages of high conversion efficiency and high cost performance. Polysilicon in crystalline silicon cells is widely used in the photovoltaic industry due to its low price. Polysilicon materials at home and abroad have been improved in technology and cost, which has accelerated and expanded the development of the photovoltaic mark...

Claims

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