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Atomic Layer Deposition Process for Fabricating Dielectric Metasurfaces Targeted to Visible Spectral Wavelengths

A kind of atomic layer deposition and dielectric technology, which is applied to the original parts for photomechanical processing, photoplate process of patterned surface, coating, etc., can solve the problem of low efficiency of metasurface

Active Publication Date: 2020-06-09
PRESIDENT & FELLOWS OF HARVARD COLLEGE
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

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Problems solved by technology

However, metasurfaces are inefficient in the visible spectrum

Method used

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  • Atomic Layer Deposition Process for Fabricating Dielectric Metasurfaces Targeted to Visible Spectral Wavelengths
  • Atomic Layer Deposition Process for Fabricating Dielectric Metasurfaces Targeted to Visible Spectral Wavelengths
  • Atomic Layer Deposition Process for Fabricating Dielectric Metasurfaces Targeted to Visible Spectral Wavelengths

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Embodiment Construction

[0053] Metasurfaces include artificial, nearly flat or planar materials composed of cells that provide control of the phase and polarization of an optical field, where the dimensions of the metasurface cells are sub-wavelength within the spectrum of interest. Unlike traditional optical components such as lenses and polarizers, which undergo electromagnetic field wavefront changes as the field propagates over a distance of several wavelengths, metasurfaces can introduce phase and polarization changes over subwavelength distances. For example, a transmissive dielectric metasurface consisting of subwavelength-spaced dielectric cells and having a nearly flat profile compared to refractive optics can provide control over optical wavefronts while avoiding the ohmic losses associated with plasmonic metasurfaces. .

[0054] Some embodiments according to the present disclosure describe dielectric metasurfaces that provide gradual phase transitions over subwavelength or wavelength compa...

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Abstract

A method of fabricating a visible spectrum optical component comprising: providing a substrate; forming a resist layer on a surface of the substrate; patterning the resist layer to form a patterned resist defining openings exposing portions of the substrate surface performing deposition to form a dielectric film on the patterned resist layer and on exposed portions of the substrate surface, wherein the top surface of the dielectric film is higher than the top surface of the patterned resist layer; removing the dielectric the top portion of the film to expose the top surface of the patterned resist layer and the top surface of the dielectric unit within the opening of the patterned resist layer; and removing the patterned resist layer to retain the dielectric unit on the substrate.

Description

[0001] Cross References to Related Applications [0002] This application claims the benefit of and priority to U.S. Provisional Patent Application No. 62 / 259,243, filed November 24, 2015, which is hereby incorporated by reference in its entirety. [0003] Statement Regarding Federal Funding or Research Development [0004] This invention was made with Government support under Grant No. FA9550-14-1-0389 awarded by the Air Force Scientific Research Service (MURI). The government has certain rights in this invention. Background technique [0005] Metasurfaces can be used to form optical components. However, metasurfaces are inefficient in the visible spectrum. It is desirable to fabricate metasurfaces with improved efficiency in the visible spectrum. [0006] Against this background, the need arose to develop the embodiments described in this disclosure. Contents of the invention [0007] According to some embodiments, in one aspect, a method of fabricating a visible spec...

Claims

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Application Information

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Patent Type & Authority Patents(China)
IPC IPC(8): G02B1/00G02B27/42G03F1/50H01L31/02
CPCG02B1/002G02B1/005G02B13/14C23C16/45525C23C16/56C23C16/042C23C16/45555G03F7/0005G03F7/40H01L31/02G02B1/02
Inventor R·C·德夫林M·科拉沙尼内加德F·卡帕索H·帕克A·A·海伊
Owner PRESIDENT & FELLOWS OF HARVARD COLLEGE