Mask device and aeration equipment
A mask and mask technology, applied in optics, originals for opto-mechanical processing, instruments, etc., can solve problems such as being unfavorable to the production of high-resolution products, affecting the exposure effect, and low effective illumination.
Active Publication Date: 2018-09-07
BOE TECH GRP CO LTD +1
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Problems solved by technology
At this time, the light beam is easy to diffract when passing through the light-transmitting region 10a, and the stray light in the light beam will also interfere with the effective light in the light beam. The illumination is small, which affects the exposure effect
figure 2 It is a comparison chart of the effective illuminance of the light passing through the light-transmitting areas with widths of 7.0 μm, 6.5 μm and 6.0 μm respectively. It can be seen that as the width of the light-transmitting area decreases, the effective illuminance of the light passing through the light-transmitting area Decrease, thus affecting the exposure effect, which is not conducive to the production of high-resolution products
Method used
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[0030] Specific embodiments of the present invention will be described in detail below in conjunction with the accompanying drawings. It should be understood that the specific embodiments described here are only used to illustrate and explain the present invention, and are not intended to limit the present invention.
[0031] The invention provides a mask device, such as image 3 As shown, the mask device includes a mask plate 10 and a semi-transparent plate 30 arranged oppositely, and the mask plate 10 includes a plurality of light-transmitting regions 10a and an opaque region 10b located outside the plurality of light-transmitting regions 10a , the translucent plate 30 is divided into translucent regions 30a corresponding to the translucent regions 10a of the mask plate 10 one by one, and a part of the translucent regions in the translucent regions 30a are transparent (such as Figure 4 a1 area in), and another part of the area is opaque ( Figure 4 In the semi-transparent...
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The invention provides a mask device. The mask device comprises a mask plate and a semi-transparent plate which are oppositely arranged, wherein the mask plate comprises a plurality of transparent regions and light-roof regions outside the transparent regions; the semi-transparent plate is divided into semi-transparent regions which are in one-to-one correspondence to the transparent regions of the mask plate; one part of the semi-transparent regions are transparent while other part of the semi-transparent regions are light-roof; in each semi-transparent region, the light-proof regions are uniformly distributed in the semi-transparent regions. Correspondingly, the invention further provides aeration equipment. The mask device can improve effective illumination received by a light-sensing layer, and is beneficial for producing a high-resolution display product.
Description
technical field [0001] The invention relates to the manufacturing field of display products, in particular to a mask device and exposure equipment. Background technique [0002] The photolithographic patterning process is a commonly used process in the production process of display products, wherein the photolithographic patterning process includes an exposure step. During exposure, the mask plate 10 is arranged opposite to the substrate 20, and the light passes through the light-transmitting region 10a of the mask plate 10 to irradiate On the photosensitive layer 11 (for example, photoresist layer) of the substrate 20, as figure 1 shown. [0003] The size of the light-transmitting area 10a on the mask plate 10 is the same as the size of the pattern to be formed. For example, when making a color-resist block of a certain color, the light-transmitting area 10a on the mask plate 10 used is the same as that of the pattern to be formed. Colors have the same pixel size. As the...
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IPC IPC(8): G03F1/50
CPCG03F1/50
Inventor 齐鹏煜张思凯汪栋
Owner BOE TECH GRP CO LTD