Preparation method of efficient wax removal and deoxidation integrated cleaning agent for copper polishing pieces

Abstract

The invention discloses a preparation method of an efficient wax removal and deoxidation integrated cleaning agent for copper polishing pieces. The method comprises the following steps: 1) oleic acidand triethanolamine are mixed according to a mass ratio of 1: 1, and are heated and stirred at a constant temperature for full reaction to obtain triethanolamine oleate; and 2) triethanolamine oleate,isomeric oleic soap, isopropanolamide, sodium gluconate, organic amine fat, EDTA, alkyl Polyglucosides, 2A1, sodium hydroxide, benzotriazole and pure water are mixed and fully stirred uniformly to obtain the cleaning agent. In the cleaning agent prepared by the preparation method of the cleaning agent, on one hand, wax and oxide layers on the surfaces of copper polishing piece products can be removed through one cleaning procedure, so that the use process is convenient and fast, the cleaning efficiency is improved, and the production cost is reduced; and on the other hand, the cleaning agentcontains no dangerous substances of strong acid and the like, so that the surfaces of the products cannot be damaged, and higher environmental protection and safety are achieved.

Description

technical field [0001] The invention relates to the field of metal cleaning, in particular to a preparation method of an efficient wax-removing and oxidation-removing integrated cleaning agent for copper polishing parts. Background technique [0002] During the manufacture and use of copper polishing products or parts, such as mirrors, there will be a pollution layer on the surface, and the pollution layer generally includes the wax remaining on the surface of the copper piece during polishing and the surface of the copper piece during the turnover process after polishing. The oxide layer formed by oxidation. However, when using traditional special cleaning agents to clean copper polished products, generally only the residual wax on the surface of the product can be removed, but the oxide layer cannot be removed. Therefore, a deoxidation process is often performed after wax removal, specifically for Use strong inorganic acids such as nitric acid and sulfuric acid to remove ...

AI Technical Summary

Problems solved by technology

Among them, on the one hand, the method for cleaning copper polished parts includes two processes, and its operation process is relatively cumbersome, which reduces the efficiency of cleaning work and increases the cost of production and processing. On the other hand, strong acid is used to remove the oxide layer. It often causes damage and corrosion to the product itself, and also pollutes the surrounding environment, and may even endanger the personal safety of the operator