A glass chemical polishing liquid
A chemical polishing and glass technology, applied in the field of chemical polishing liquid and polishing liquid, can solve the problems that the particle size and distribution of polishing powder and abrasive agent cannot be strictly controlled, and the performance of polishing powder is difficult to control stably, so as to achieve good polishing effect, enhanced stability, The effect of strong physical stability
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Embodiment 1
[0031] Ultrasonic dispersion: According to the components in Example 1 of Table 1, the polishing powder is dispersed in deionized water with high-power ultrasonic method to obtain a slurry; the polishing powder includes the following components in mass percentage: 10% Ce 1-x Ti x o 2 , 10% microcrystalline frosted, the balance is silicon dioxide; the Ce 1-x Ti x o 2 The preparation method comprises the following steps: in Ce(NO 3 ) 3 Add Ti(SO 4 ) 2 , after stirring in a constant temperature water bath, add H 2 o 2 and NH 3 .H 2 O, adjust the pH to 9 and then react for 2 hours. After suction filtration and washing, use a low-speed stirring ball mill to grind, and introduce a high-speed horizontal ball mill to carry out ultrafine treatment and then spray-dry to obtain; the Ce 1-x Ti x o 2 Ce modified by N-lauroyl ethylenediamine triacetic acid 1-x Ti x o 2 , the modification process specifically includes the following steps: adding Ce to N-lauroyl ethylenediamin...
Embodiment 2
[0034] Ultrasonic dispersion: According to the components in Example 2 of Table 1, the polishing powder is dispersed in deionized water with high-power ultrasonic method to obtain a slurry; the polishing powder includes the following components in mass percentage: 12% Ce 1-x Ti x o 2 , 12% microcrystalline frosted, the balance is silicon dioxide; the Ce 1-x Ti x o 2 The preparation method comprises the following steps: in Ce(NO 3 ) 3 Add Ti(SO 4 ) 2 , after stirring in a constant temperature water bath, add H 2 o 2 and NH 3 .H 2 O, adjust the pH to 9.2 and then react for 2.2 hours. After suction filtration and washing, use a low-speed stirring ball mill to grind, and introduce a high-speed horizontal ball mill to carry out ultrafine treatment and then spray-dry to obtain; the Ce 1-x Ti x o 2 Ce modified by N-lauroyl ethylenediamine triacetic acid 1-x Ti x o 2 , the modification process specifically includes the following steps: adding Ce to N-lauroyl ethylenedi...
Embodiment 3
[0037] Ultrasonic dispersion: According to the components in Example 3 of Table 1, the polishing powder is dispersed in deionized water with a high-power ultrasonic method to obtain a slurry; the polishing powder includes the following components in mass percentage: 15% Ce 1-x Ti x o 2 , 15% microcrystalline frosted, the balance is silicon dioxide; the Ce 1-x Ti x o 2 The preparation method comprises the following steps: in Ce(NO 3 ) 3 Add Ti(SO 4 ) 2 , after stirring in a constant temperature water bath, add H 2 o 2 and NH 3 .H 2 O, adjust the pH to 9.5 and then react for 2.5 hours. After suction filtration and washing, use a low-speed stirring ball mill to grind, and introduce a high-speed horizontal ball mill to carry out ultrafine treatment and spray drying to obtain; the Ce 1-x Ti x o 2 Ce modified by N-lauroyl ethylenediamine triacetic acid 1-x Ti x o 2 , the modification process specifically includes the following steps: adding Ce to N-lauroyl ethylenedi...
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