Glaze chemical polishing fluid

A chemical polishing and glazed technology, which is applied in the field of polishing liquid and chemical polishing liquid, can solve the problems that the performance of polishing powder is difficult to be stably controlled, and the particle size and distribution of polishing powder and abrasive can not be strictly controlled, so as to achieve good polishing effect, enhanced stability, The effect of tight particle arrangement and distribution

Active Publication Date: 2018-11-16
NINGBO TSIANYU COLORED GLAZE PROD CO LTD
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

Due to the high specific surface activation energy of micron and submicron agent solid particles, the agglomeration phenomenon makes winnowing unable to strictly control the particle size and distribution of polishing powder abrasives, making it difficult to stably control the performance of polishing powder in terms of scratching

Method used

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  • Glaze chemical polishing fluid
  • Glaze chemical polishing fluid
  • Glaze chemical polishing fluid

Examples

Experimental program
Comparison scheme
Effect test

Embodiment 1

[0030] Ultrasonic dispersion: According to the components in Example 1 of Table 1, the polishing powder is dispersed in deionized water with high-power ultrasonic method to obtain a slurry; the polishing powder includes the following components in mass percentage: 10% Ce 1-x Ti x o 2 , 10% microcrystalline frosted, the balance is silicon dioxide; the Ce 1-x Ti x o 2 The preparation method comprises the following steps: in Ce(NO 3 ) 3 Add Ti(SO 4 ) 2 , after stirring in a constant temperature water bath, add H 2 o 2 and NH 3 .H 2 O, adjust the pH to 9 and then react for 2 hours. After suction filtration and washing, use a low-speed stirring ball mill to grind, and introduce a high-speed horizontal ball mill to carry out ultrafine treatment and then spray-dry to obtain; the Ce 1-x Ti x o 2 Ce modified by N-lauroyl ethylenediamine triacetic acid 1-x Ti x o 2 , the modification process specifically includes the following steps: adding Ce to N-lauroyl ethylenediamin...

Embodiment 2

[0033] Ultrasonic dispersion: According to the components in Example 2 of Table 1, the polishing powder is dispersed in deionized water with high-power ultrasonic method to obtain a slurry; the polishing powder includes the following components in mass percentage: 12% Ce 1-x Ti x o 2 , 12% microcrystalline frosted, the balance is silicon dioxide; the Ce 1-x Ti x o 2 The preparation method comprises the following steps: in Ce(NO 3 ) 3 Add Ti(SO 4 ) 2 , after stirring in a constant temperature water bath, add H 2 o 2 and NH 3 .H 2 O, adjust the pH to 9.2 and then react for 2.2 hours. After suction filtration and washing, use a low-speed stirring ball mill to grind, and introduce a high-speed horizontal ball mill to carry out ultrafine treatment and then spray-dry to obtain; the Ce 1-x Ti x o 2 Ce modified by N-lauroyl ethylenediamine triacetic acid 1-x Ti x o 2 , the modification process specifically includes the following steps: adding Ce to N-lauroyl ethylenedi...

Embodiment 3

[0036] Ultrasonic dispersion: According to the components in Example 3 of Table 1, the polishing powder is dispersed in deionized water with a high-power ultrasonic method to obtain a slurry; the polishing powder includes the following components in mass percentage: 15% Ce 1-x Ti x o 2 , 15% microcrystalline frosted, the balance is silicon dioxide; the Ce 1-x Ti x o 2 The preparation method comprises the following steps: in Ce(NO 3 ) 3 Add Ti(SO 4 ) 2 , after stirring in a constant temperature water bath, add H 2 o 2 and NH 3 .H 2 O, adjust the pH to 9.5 and then react for 2.5 hours. After suction filtration and washing, use a low-speed stirring ball mill to grind, and introduce a high-speed horizontal ball mill to carry out ultrafine treatment and spray drying to obtain; the Ce 1-x Ti x o 2 Ce modified by N-lauroyl ethylenediamine triacetic acid 1-x Ti x o 2 , the modification process specifically includes the following steps: adding Ce to N-lauroyl ethylenedi...

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Abstract

The invention relates to a polishing fluid, in particular, relates to a chemical polishing fluid applied to the field of glaze, and belongs to the field of glaze polishing. The glaze chemical polishing fluid comprises the following components in parts by weight: 20-30 parts by weight of micron carbonyl nickel powder, 20-30 parts by weight of polishing powder, 20-30 parts by weight of citric acid,60-80 parts by weight of hydrofluoric acid, 20-30 parts by weight of glycerin, 10-20 parts by weight of deionized water, and 20-30 parts by weight of an activating agent. By using the micron carbonylnickel powder as magnetic particles and addition of the polishing powder, citric acid and hydrofluoric acid, the obtained glaze chemical polishing fluid has strong physical stability and good polishing effect.

Description

field of invention [0001] The invention relates to a polishing liquid, in particular to a chemical polishing liquid applied in the field of colored glaze, and belongs to the field of colored glaze polishing. Background technique [0002] At present, the glass polishing liquid used in the production of glass processing enterprises mainly uses large-particle rare earth oxide powder as polishing friction agent, the overall polishing rate is low, the dispersion stability is poor, it is easy to cause serious surface scratches, and there are also low flattening and polishing efficiency. defect. Long-time polishing often greatly reduces the polishing efficiency, resulting in rapid wear of the polishing machine, low production efficiency, and a large consumption of consumables. The particle size control of polishing powder is usually done by multi-stage winnowing. Due to the high specific surface activation energy of micron and submicron agent solid particles, the agglomeration ph...

Claims

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Application Information

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IPC IPC(8): C09G1/02
CPCC09G1/02
Inventor 徐琳雯谢强
Owner NINGBO TSIANYU COLORED GLAZE PROD CO LTD
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