A developer treatment device
A processing device and developing solution technology, which is applied in photography, equipment, photoplate-making process of patterned surface, etc., can solve the problems of slow developing speed, uneven development of photolithographic patterns of developing solution, uneven spraying of developing solution, etc. Achieve the effect of improving utilization rate and improving uniformity
Active Publication Date: 2021-11-19
上海德迈世欧科技有限公司
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Problems solved by technology
[0002] In the prior art, the developer solution treatment device used after photolithography exposure usually adopts the setting of soaking or spraying to apply the developing solution to the exposed photoresist. Some spraying devices will produce uneven spraying of the developer during the development process, especially the uneven distribution of the developer at the edge of the spray surface of the developer nozzle, resulting in uneven development of the lithography pattern, which in turn reduces the processing accuracy of the semiconductor process
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[0017] see figure 1 and figure 2 , The developing solution processing device of the present invention comprises: a developing solution spray head, and the developing solution spray head is composed of a spray head main body, a main liquid inlet 1, an auxiliary liquid inlet 2, a main liquid chamber 3, an auxiliary liquid chamber 4, and a main discharge port 5, The auxiliary ejection port 6 is composed of the main body of the main liquid chamber 3 is cylindrical, and the diameter at the junction with the main ejection port 5 decreases linearly to the main ejection port 5, and the diameter of the main ejection port 5 increases non-linearly. The ejection port 6 is connected with the auxiliary liquid chamber 4, and there are a plurality of auxiliary ejection ports 6, extending spirally and obliquely downward from the auxiliary liquid chamber 4, and the auxiliary ejection ports 6 are evenly distributed on the outside of the main ejection port 5, and the auxiliary ejection ports 6....
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The present invention provides a developing solution processing device, which is used in the photolithography process. The developing solution processing device comprises: a developing solution nozzle, and the developing solution nozzle consists of a nozzle main body, a main liquid inlet, an auxiliary liquid inlet, a main Liquid chamber, auxiliary liquid chamber, main ejection port, auxiliary ejection port; processing chamber, the processing chamber is barrel-shaped, and the developer nozzle is installed at the top center of the processing chamber; wafer base, the The wafer base is used to fix the wafer to be developed, the wafer base can drive the wafer to rotate, and the upper surface of the base has a characteristic distance from the lower surface of the developer nozzle; the developer storage device, The developing solution storage device is used for storing the developing solution; the developing solution recycling device is arranged under the wafer base to recycle the developing solution; evenly distributed in the room.
Description
technical field [0001] The invention relates to semiconductor liquid processing equipment, in particular to a developer liquid processing device used in photolithography technology. Background technique [0002] In the prior art, the developer solution treatment device used after photolithography exposure usually adopts the setting of soaking or spraying to apply the developing solution to the exposed photoresist. Some spraying devices will produce uneven spraying of the developer during the development process, especially the uneven distribution of the developer at the edge of the spray surface of the developer nozzle, resulting in uneven development of the lithography pattern, which in turn reduces the processing accuracy of the semiconductor process . Contents of the invention [0003] Based on solving the above-mentioned problems, the present invention provides a developer solution processing device for use in photolithography. The liquid inlet, the main liquid chamb...
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IPC IPC(8): G03F7/30
CPCG03F7/3057
Inventor 贺妍孙德瑞刘丹
Owner 上海德迈世欧科技有限公司