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Silicon-based optical waveguide structure and manufacturing method thereof

A technology for a silicon-based optical waveguide and a manufacturing method, which is applied in the directions of light guides, optics, optical components, etc., can solve the problems of high cost and difficult manufacturing process of silicon-based optical waveguide structures, and achieves low manufacturing cost, reduced line width, and wide range of applications. The effect of the application foreground

Active Publication Date: 2020-09-22
SHANGHAI IND U TECH RES INST
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  • Abstract
  • Description
  • Claims
  • Application Information

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Problems solved by technology

[0006] In view of the above-mentioned shortcomings of the prior art, the object of the present invention is to provide a silicon-based optical waveguide structure and its manufacturing method, which are used to solve the problems of difficult manufacturing process and high cost of the silicon-based optical waveguide structure in the prior art

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  • Silicon-based optical waveguide structure and manufacturing method thereof
  • Silicon-based optical waveguide structure and manufacturing method thereof
  • Silicon-based optical waveguide structure and manufacturing method thereof

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Embodiment Construction

[0039] Embodiments of the present invention are described below through specific examples, and those skilled in the art can easily understand other advantages and effects of the present invention from the content disclosed in this specification. The present invention can also be implemented or applied through other different specific implementation modes, and various modifications or changes can be made to the details in this specification based on different viewpoints and applications without departing from the spirit of the present invention.

[0040] see Figure 2 ~ Figure 6 . It should be noted that the diagrams provided in this embodiment are only schematically illustrating the basic idea of ​​the present invention, so that only the components related to the present invention are shown in the diagrams rather than the number, shape and Dimensional drawing, the type, quantity and proportion of each component can be changed arbitrarily during actual implementation, and the ...

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Abstract

The invention provides a silicon-based optical waveguide structure and a manufacturing method thereof. The manufacturing method includes the following steps that: 1) an SOI substrate is provided, wherein the SOI substrate comprises a silicon substrate, a buried oxide layer and top silicon; 2) The top silicon is etched, so that a strip-shaped silicon layer can be formed; and 3) the strip-shaped silicon layer is oxidized through an oxidation process, so that a silicon dioxide-coated submicron-order silicon waveguide core layer can be formed; the refractive index of the silicon waveguide core layer is higher than that of a silicon dioxide layer surrounding the silicon waveguide core layer, such that the transmission of optical signals is limited to the silicon waveguide core layer, and a silicon-based optical waveguide structure can be formed. According to the silicon-based optical waveguide structure and the manufacturing method thereof, the line width of the silicon waveguide core layeris decreased by means of high temperature oxidation, so as to achieve a submicron scale, and therefore, the use of expensive high-precision stepping lithography equipment can be avoided; and the oxidation process can assist in decreasing the roughness of the sidewall of the silicon waveguide, and therefore, transmission loss can be decreased.

Description

technical field [0001] The invention belongs to the field of semiconductors and optoelectronic integration, and in particular relates to a silicon-based optical waveguide structure and a manufacturing method thereof. Background technique [0002] With the continuous improvement of people's requirements for information transmission and processing speed and the advent of the era of multi-core computing, metal-based electrical interconnections will become a development bottleneck due to defects such as overheating, delay, and electronic interference. The use of optical interconnection to replace electrical interconnection can effectively solve this problem. In the specific implementation of optical interconnection, silicon-based optical interconnection has become the first choice due to its unparalleled cost and technical advantages. Silicon-based optical interconnection can not only give full play to the advantages of fast optical interconnection speed, large bandwidth, anti-...

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Application Information

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Patent Type & Authority Patents(China)
IPC IPC(8): G02B6/136
CPCG02B6/136
Inventor 盛振武爱民仇超赵瑛璇高腾甘甫烷王曦
Owner SHANGHAI IND U TECH RES INST