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Electrostatic protection device

A technology of electrostatic protection and devices, which is applied in the field of electrostatic protection devices, can solve problems such as difficult to achieve high maintenance voltage characteristics and affect protection effects, and achieve the effects of enhancing electrostatic discharge capability, reducing base concentration, and increasing maintenance voltage

Active Publication Date: 2018-11-27
HUNAN UNIV
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0005] In view of the above-mentioned situation, the object of the present invention is to solve the problem that in the prior art, the existing SCR device is difficult to achieve high sustain voltage characteristics in its limited layout area and affects the actual protection effect in practical applications.

Method used

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Embodiment Construction

[0020] In order to make the above objects, features and advantages of the present invention more comprehensible, specific implementations of the present invention will be described in detail below in conjunction with the accompanying drawings. Several embodiments of the invention are shown in the drawings. However, the present invention can be embodied in many different forms and is not limited to the embodiments described herein. Rather, these embodiments are provided so that the disclosure of the present invention will be thorough and complete.

[0021] It should be noted that when an element is referred to as being “fixed on” another element, it may be directly on the other element or there may be an intervening element. When an element is referred to as being "connected to" another element, it can be directly connected to the other element or intervening elements may also be present. As used herein, the terms "vertical," "horizontal," "left," "right," "upper," "lower," a...

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Abstract

The invention provides an electrostatic protection device comprising a substrate, a deep N trap is arranged in the substrate, a first N trap, a first P trap and a second N trap are sequentially arranged in the deep N trap from left to right, a first N+ injection region, a first P+ injection region and a second N+ injection region are arranged in the first N trap, the second N+ injection region isbridged between the first N trap and the first P trap, a third N+ injection region, a second P+ injection region and a fourth N+ injection region are arranged in the first P trap, a fifth N+ injectionregion, a third P+ injection region and a sixth N+ injection region are arranged in the second N trap, the fifth N+ injection region is bridged between the first P trap and the second N trap, the first N trap, the first P trap, and the second N trap form a first NPN structure, the second N+ injection region, the first P trap and the third N+ injection region form a second NPN structure. Accordingto the electrostatic protection device, the voltage can be maintained, the trigger voltage can be reduced, and the electrostatic discharge capacity can be enhanced.

Description

technical field [0001] The invention relates to the technical field of electrostatic protection for integrated circuits, in particular to an electrostatic protection device. Background technique [0002] In all links of integrated circuits, charge accumulation may occur. Under certain conditions, the charge will be transferred, and the instantaneous large current may exceed the critical value of the device and cause the chip to burn. Statistical data show that: Electro Static Discharge (ESD) is the main cause of failure of integrated circuits, especially in power integrated circuits. Therefore, electrostatic discharge has become the most important issue for designers. [0003] In order to reduce the economic loss caused by electrostatic discharge in integrated circuits, the most effective method is to design corresponding ESD protection devices with high performance ratio for each input and output port of integrated circuits. At present, ESD protection measures for conven...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): H01L27/02
CPCH01L27/0207H01L27/0262H01L27/0296
Inventor 陈卓俊曾云彭伟金湘亮张云吴志强
Owner HUNAN UNIV
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