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On-line monitoring device and application thereof

A monitoring device and standard curve technology, applied in the direction of cells, electrolysis process, electrolysis components, etc., can solve the problem of many interference factors in optical methods, and achieve the effect of real-time monitoring of solution concentration

Pending Publication Date: 2018-11-30
GUANGDONG SKYCHEM TECH LTD
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0002] In the process of electroplating copper potions, photometry is usually used to convert the concentration of ferric ions into electrical signals by using ferric ions to absorb light with a wavelength of 302nm, and then control the corresponding electromechanical devices through microcomputers to realize the concentration of ferric ions. On-line control; this method can only monitor ferric ions. To detect other ions, it is necessary to add another layer of detection products with other wavelengths. Moreover, the optical method has the disadvantage of many interference factors, which limits its application.

Method used

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Embodiment 1

[0049] This embodiment provides an online monitoring device, such as figure 1 As shown, it includes an electroplating unit 1, a dissolution unit 2, a first delivery device 3, an analysis pool 4, a controller 5 and a second delivery device 6; the analysis pool 4 is connected to the electroplating unit 1; one end of the controller 5 is connected to The analysis pool 4 is connected, and the other end is connected with the first conveying device 3; the second outlet at the bottom of the electroplating unit 1 is connected with the inlet of the dissolving unit 2 through the first conveying device 3, and the top extraction port of the dissolving unit 2 is connected with the Plating unit 1 top connection.

[0050] Such as figure 2 As shown, the analysis cell 4 is a cavity 41 for transporting liquid, and electrodes are inserted in the cavity; the electrodes include a working electrode 42, a reference electrode 43 and a counter electrode 44; wherein the working electrode 42 is a plati...

Embodiment 2

[0061] This embodiment provides an online monitoring device, such as figure 1 As shown, it includes an electroplating unit 1, a dissolution unit 2, a first delivery device 3, an analysis pool 4, a controller 5 and a second delivery device 6; the analysis pool 4 is connected to the electroplating unit 1; one end of the controller 5 is connected to The analysis pool 4 is connected, and the other end is connected with the first conveying device 3; the second outlet at the bottom of the electroplating unit 1 is connected with the inlet of the dissolving unit 2 through the first conveying device 3, and the top extraction port of the dissolving unit 2 is connected with the Plating unit 1 top connection.

[0062] Such as figure 2 As shown, the analysis cell 4 is a cavity 41 for transporting liquid, and electrodes are inserted in the cavity; the electrodes include a working electrode 42, a reference electrode 43 and a counter electrode 44; wherein the working electrode 42 is a plati...

Embodiment 3

[0070] This embodiment provides an online monitoring device, such as figure 1 As shown, it includes an electroplating unit 1, a dissolution unit 2, a first delivery device 3, an analysis pool 4, a controller 5 and a second delivery device 6; the analysis pool 4 is connected to the electroplating unit 1; one end of the controller 5 is connected to The analysis pool 4 is connected, and the other end is connected with the first conveying device 3; the second outlet at the bottom of the electroplating unit 1 is connected with the inlet of the dissolving unit 2 through the first conveying device 3, and the top extraction port of the dissolving unit 2 is connected with the Plating unit 1 top connection.

[0071] Such as figure 2As shown, the analysis cell 4 is a cavity 41 for transporting liquid, and electrodes are inserted in the cavity; the electrodes include a working electrode 42, a reference electrode 43 and a counter electrode 44; wherein the working electrode 42 is a platin...

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Abstract

The invention provides an on-line monitoring device and an application thereof. The on-line monitoring device comprises an electroplating unit, a dissolving unit and a first conveying device which isconnected between the electroplating unit and the dissolving unit; the online monitoring device further comprises an analysis pool and a controller, the analysis pool is connected with the electroplating unit, one end of the controller is connected with the analysis pool, and the other end of the controller is connected with the first conveying device. The device can be used for monitoring concentration of metal ions in the electroplating solution in real time, so that the concentration of the metal ions in the electroplating solution can be adjusted, and positive effects are achieved on the electroplating effect.

Description

technical field [0001] The invention relates to the field of electroplating, and relates to an on-line monitoring device and its application. Background technique [0002] In the process of electroplating copper potions, photometry is usually used to convert the concentration of ferric ions into electrical signals by using ferric ions to absorb light with a wavelength of 302nm, and then control the corresponding electromechanical devices through microcomputers to realize the concentration of ferric ions. On-line control; this method can only monitor ferric ions, and to detect other ions, it is necessary to add a layer of detection products with other wavelengths, and the optical method has the disadvantage of many interference factors, which limits its application. [0003] CN102081408A discloses an ion concentration monitoring system, which includes a coating chamber, a gas supply device for providing mixed gas to the coating chamber, an ionization vacuum tube, an optical f...

Claims

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Application Information

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IPC IPC(8): C25D21/12C25D21/14
CPCC25D21/12C25D21/14
Inventor 章晓冬冯建松苏向荣刘江波王亚君
Owner GUANGDONG SKYCHEM TECH LTD