Semiconductor structure
A technology of semiconductor and stacked structure, applied in the direction of semiconductor devices, electrical solid devices, electrical components, etc., can solve the problems of large stress on the substrate, affecting the performance of the memory, and prone to voids, etc., to reduce the possibility of warping , reduced strain, and reduced grain size
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[0021] A semiconductor structure proposed by the present invention and its preparation method will be described in detail below with reference to the accompanying drawings and specific embodiments.
[0022] see figure 1 , is a flow chart of the method for preparing the semiconductor structure in a specific embodiment. The manufacturing method of the semiconductor structure includes the following steps: S11: providing a substrate, and a stack structure is formed on the surface of the substrate. S12: Forming a gate line spacer in the stack structure, the gate line spacer penetrating through the stack structure to the surface of the substrate. S13: forming a semiconductor layer in the gate line spacer, the semiconductor layer is filled in the gate line spacer, and the semiconductor layer is doped with dopant atoms, and the dopant atoms can reduce the The grain size of the semiconductor layer.
[0023] see Figure 2 to Figure 6 , is a structural schematic diagram of a process ...
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