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Gas flow monitoring system, gas flow monitoring method and main and backup pipeline switching method

A technology of monitoring system and gas flow, applied in testing/monitoring control system, flow control, general control system, etc., can solve problems such as infeasibility of MFC, and achieve the effect of reducing detection error rate and abnormal downtime

Inactive Publication Date: 2018-12-25
WUHAN CHINA STAR OPTOELECTRONICS TECH CO LTD
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

Of course, MFC equipment manufacturers can accurately confirm the accuracy, but the MFC equipment must be disassembled, which is only suitable for special methods in the laboratory.
Moreover, this method is completely infeasible for MFCs already installed on factory equipment

Method used

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  • Gas flow monitoring system, gas flow monitoring method and main and backup pipeline switching method
  • Gas flow monitoring system, gas flow monitoring method and main and backup pipeline switching method
  • Gas flow monitoring system, gas flow monitoring method and main and backup pipeline switching method

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Embodiment Construction

[0023] The following will clearly and completely describe the technical solutions in the embodiments of the present invention with reference to the drawings in the embodiments of the present invention. Apparently, the described embodiments are only some of the embodiments of the present invention, but not all of them. Based on the embodiments of the present invention, all other embodiments obtained by those skilled in the art without creative efforts fall within the protection scope of the present invention.

[0024] The terms "first", "second", "third", etc. (if any) in the description and claims of the present invention and the above drawings are used to distinguish similar objects and not necessarily to describe a specific order or sequentially. It should be understood that the items so described are interchangeable under appropriate circumstances. Furthermore, the terms "comprising" and "having", as well as any variations thereof, are intended to cover a non-exclusive in...

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Abstract

The invention provides a gas flow monitoring system, a gas flow monitoring method adopting the gas flow monitoring system and a main and backup pipeline switching method. The gas flow monitoring system comprises at least one main pipeline and one alternate pipeline, wherein one ends of the main pipeline and the alternate pipeline are respectively connected to an external gas supply system and theother ends of the main pipeline and the alternate pipeline are respectively connected to a process cavity; a main mass flow controller, at least one main pneumatic switch valve and a main switch valveare mounted on the main pipeline; an alternate mass flow controller and at least one alternate pneumatic switch valve are mounted on the alternate pipeline; and an alternate switch valve is mounted between the alternate pipeline and each main pipeline.

Description

technical field [0001] The invention relates to the technical field of fluid control, in particular to a gas flow monitoring system, a monitoring method using the gas flow monitoring system, and a master-backup switching method using the gas flow monitoring system. Background technique [0002] MFC, Mass Flow Controller (mass flow controller) is a device for controlling gas flow, which is widely used in Dry Etch (dry etching) and CVD (chemical vapor deposition, chemical vapor deposition) equipment. The basic structure of MFC and pipeline connection is as follows: figure 1 shown. figure 1 The gas flow system shown includes a process chamber 110, which is connected to three pipelines (including the first main pipeline) through a FRC (Frame Rate Control, frame ratio control) flow proportional controller 120 131, the second main pipeline 132 and the third main pipeline 133), each pipeline can flow a kind of gas (such as the first gas, the second gas and the third gas), and on ...

Claims

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Application Information

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IPC IPC(8): G05B23/00G05D7/00
CPCG05B23/00G05D7/00
Inventor 冯文杰
Owner WUHAN CHINA STAR OPTOELECTRONICS TECH CO LTD