Conductive network wire pattern structure and manufacturing method thereof

Abstract

The invention provides a conductive network line pattern structure and a manufacturing method thereof. The conductive network line pattern structure comprises a plurality of conductive network lines formed on a transparent substrate; barrier pattern layers are arranged on part of the conductive network lines in the conductive network lines; and the barrier pattern layers have different heights. The barrier pattern layers are preferably formed by a nano-imprinting manufacturing process. The invention further provides the manufacturing method of the conductive network line pattern structure. Theconductive network lines with the nanoscale line widths and low light reflection can be obtained.

Description

technical field [0001] The present invention relates to a conductive mesh pattern structure, in particular to a conductive mesh pattern structure and a manufacturing method using nanoimprinting to form photoresist with different heights. Background technique [0002] In the 1960s, Heilmeier and others from RCA Corporation (Radio Corporation of America Corporation) developed liquid crystal displays, creating a new era of digital display. Because liquid crystal displays have the advantages of thinness, portability, and low power consumption, they are mass-produced along with the vigorous development of various digital electronic products. In the 1970s, people developed touch technology that can determine the location, allowing people to input specific information by pressing the location. By interleaving the two electric fields perpendicular to each other, the position of the touch point can be identified through the signal difference at the interlaced position during touch s...

AI Technical Summary

Problems solved by technology

[0008] However, the above-mentioned technologies are in mass production, and there are still many problems to be overcome. (1) To make the metal lines invisible, the width of the metal lines may have to be less than 5um, which requires high-precision equipment; (2) In order to achieve users can Accepted 98% light transmittance, the sensing area should be reduced by 98%, and the relative touch sensing volume may also be reduced by 50 times; (3) The spacing of the metal grid is too large, and the mutual capacitance is too small to measure the sensing signal

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