Unlock instant, AI-driven research and patent intelligence for your innovation.

Photoelectric conversion element and photoelectric conversion device

A technology of photoelectric conversion elements and electrodes, applied in electrical components, photovoltaic power generation, circuits, etc., can solve the problem of reducing the area of ​​sunlight and achieve the effect of increasing the amount of current collection

Active Publication Date: 2019-04-02
SHARP KK
View PDF12 Cites 0 Cited by
  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0003] However, when electrodes are formed on the light-receiving surface, since the electrodes reflect and absorb sunlight, the amount of incident sunlight is only reduced by an amount corresponding to the area of ​​the electrodes.

Method used

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
View more

Image

Smart Image Click on the blue labels to locate them in the text.
Viewing Examples
Smart Image
  • Photoelectric conversion element and photoelectric conversion device
  • Photoelectric conversion element and photoelectric conversion device
  • Photoelectric conversion element and photoelectric conversion device

Examples

Experimental program
Comparison scheme
Effect test

Embodiment approach 1

[0041]

[0042] Figure 1A A schematic top view showing the back side of the heterojunction back contact cell 10 of Embodiment 1, Figure 1B A schematic enlarged plan view of the rear surface of the heterojunction back contact cell 10 according to Embodiment 1 is shown. Such as Figure 1A as well as Figure 1B As shown, the heterojunction back contact cell 10 according to Embodiment 1 has a p-electrode 7 and an n-electrode 8 on the back side of the n-type semiconductor substrate 1 . The p-electrode 7 is located on the p-type amorphous semiconductor film 3 , and the n-electrode 8 is located on the n-type amorphous semiconductor film 5 . Rectangular island-shaped p-electrodes 7 and n-electrodes 8 extend in the same direction toward the periphery of the n-type semiconductor substrate 1 at intervals. The p-electrode 7 extends closer to the periphery of the n-type semiconductor substrate 1 than the n-electrode 8 arranged beside the p-electrode 7 . The length L1 between the tip...

Embodiment approach 2

[0076] Figure 13A A schematic top view showing the back side of the heterojunction back contact cell 10 according to Embodiment 2, Figure 13B A schematic enlarged plan view of the rear surface of the heterojunction back contact cell 10 according to Embodiment 2 is shown. Such as Figure 13A as well as Figure 13B As shown, the heterojunction back contact cell 10 according to Embodiment 2 is characterized in that an end 7b of the p-electrode 7 close to the n-type semiconductor substrate 1 extends in a direction different from the direction in which the p-electrode 7 extends. In addition, since the p-electrode 7 is not a comb-shaped electrode, a space is provided between the one end 7 b of the p-electrode 7 and the one end 7 b of the p-electrode 7 adjacent to the one end 7 b of the p-electrode 7 .

[0077] The description of Embodiment 2 other than the above is the same as that of Embodiment 1, and therefore, the description thereof will not be repeated.

Embodiment approach 3

[0079] The heterojunction back contact cell 10 according to Embodiment 3 is characterized in that, instead of partial removal of the first stacked body 51 using the etching paste 31 and partial removal of the second stacked body 52 using the etching mask 32, each Partial removal of the first layered body 51 and partial removal of the second laminated body 52 by irradiation of laser light are performed.

[0080] Figure 14 An example of a method of partially removing the first laminate 51 by laser irradiation is illustrated in the schematic cross-sectional view of . Such as Figure 14As shown, the p-type amorphous semiconductor film 3 of the first laminate 51 is partially irradiated with laser light 61 to heat and evaporate the first laminate 51 , whereby partial removal of the first laminate 51 can be performed.

[0081] Figure 15 An example of a method of partially removing the second laminate 52 by laser irradiation is illustrated in the schematic cross-sectional view of...

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

PUM

PropertyMeasurementUnit
lengthaaaaaaaaaa
Login to View More

Abstract

Provided is a photoelectric conversion element comprising: a p-type or n-type semiconductor substrate (1); a p-type amorphous semiconductor film (3) and n-type amorphous semiconductor film (5) on a first surface side; a p electrode (7) on the p-type amorphous semiconductor film (3); and an n electrode (8) on the n-type amorphous semiconductor film (5). The p electrode (7) and n electrode (8) are arranged with a gap therebetween. The p-type amorphous semiconductor film (3) surrounds the n-type amorphous semiconductor film (5) in the in-plane direction of the semiconductor substrate (1), and anedge part (5a) of the n-type amorphous semiconductor film (5) is a region overlapping with the p-type amorphous semiconductor film (3). The n electrode (8) is positioned on the inner side of a regionof the n-type amorphous semiconductor film (5) surrounded by the overlapping region.

Description

technical field [0001] The present invention relates to a photoelectric conversion element and a photoelectric conversion device. This application claims priority based on Japanese Patent Application No. 2016-159105 filed on August 15, 2016. The entire description content of this Japanese patent application is incorporated in this specification by reference. Background technique [0002] In recent years, especially from the viewpoint of global environmental problems, expectations for solar cells that directly convert sunlight energy into electrical energy have rapidly increased as next-generation energy sources. Among them, solar cells that are most manufactured and sold at present have a structure in which electrodes are formed on a light-receiving surface on which sunlight is incident and on a back surface opposite to the light-receiving surface. [0003] However, when electrodes are formed on the light-receiving surface, since the electrodes reflect and absorb sunlight,...

Claims

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

Application Information

Patent Timeline
no application Login to View More
Patent Type & Authority Applications(China)
IPC IPC(8): H01L31/0224H01L31/0747
CPCH01L31/0747H01L31/035272H01L31/022433H01L31/022441H01L31/202Y02P70/50Y02E10/50H01L31/02013H01L31/02363
Inventor 肥后辉明冈本亲扶小林正道石井真人森健史松本雄太
Owner SHARP KK