Method and device for processing reticle in computational lithography
A computational lithography and reticle technology, which is applied in the field of computational lithography and can solve problems such as low efficiency of computational lithography
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[0093] In order to solve the problem that the processing method of the reticle in the prior art requires a lot of time and space to store, read and transmit the basic graphics, and makes the efficiency of computational lithography low, the application discloses a computational lithography Mask processing method and device.
[0094] see figure 1 As shown in the schematic diagram of the workflow, the first embodiment of the present application discloses a method for processing a reticle in computational lithography, including:
[0095] Step S11, acquiring a reticle pattern, wherein the reticle pattern includes a plurality of polygons.
[0096] The mask (Mask) is an indispensable part in the photolithography process. Pre-designed patterns are processed on the mask, and light passes through it to transmit the pre-designed patterns on the surface of the wafer. The original unprocessed mask is a transparent glass / quartz substrate, and the pre-designed graphics are drawn by corresp...
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