Chip for direct in situ characterization of TEM structure-activity correlation and fabrication method thereof
A manufacturing method and chip technology, which are applied in the preparation of test samples, material analysis using radiation, instruments, etc., can solve problems such as the inability to correlate material structure with material physicochemical properties, and achieve the effect of real-time characterization
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Embodiment 1
[0074] refer to Figure 1 ~ Figure 4 , this embodiment provides a chip for direct in-situ characterization of TEM structure-activity correlation, the chip includes a main chip and a secondary chip, wherein the main chip includes:
[0075] A cantilever beam 17, the cantilever beam 17 includes an observation hole 18; the resonance of the cantilever beam 17 is used to detect the mass change of the sample to be measured on the cantilever beam 17;
[0076] The main chip groove 9, the main chip groove 9 is located below the cantilever beam 17, through which the resonance of the cantilever beam 17 provides an accommodation space;
[0077] The main chip window 10, the main chip window 10 is located below the observation hole 18;
[0078] An air hole, the air hole is located on the outside of the cantilever beam 17 and runs through the main chip, and the air hole includes the air inlet hole 19 of the main chip and the air outlet hole 20 of the main chip;
[0079] The auxiliary chips ...
Embodiment 2
[0097] This embodiment also provides a method for making a chip for direct in-situ characterization of TEM structure-activity correlation, the chip includes a main chip and a secondary chip, wherein making the main chip includes the following steps:
[0098] Provide the main chip substrate;
[0099] Fabricate a cantilever beam, a main chip groove, a main chip window, and an air hole in the main chip substrate; wherein, the cantilever beam includes an observation hole; the main chip groove is located below the cantilever beam, passing through the main chip The groove provides accommodation space for the resonance of the cantilever beam; the main chip window is located below the observation hole; the air hole is located outside the cantilever beam and runs through the main chip, and the air hole includes the air intake of the main chip hole and the air outlet of the main chip; the resonance of the cantilever beam is used to detect the quality change of the sample to be measured on...
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