Process for coating the surface of a solid substrate with a layer comprising a ceramic compound and the coated substrate obtained
A technology of solid substrates and compounds, applied in the direction of plating, coating, support elements of blades, etc. of superimposed layers, capable of solving different problems
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no. 1 approach
[0155] According to a first embodiment, a layer 1 according to the invention can be applied to a layer 2 obtained by SPS with a porous columnar microstructure ( image 3 Layer 6) in the middle.
[0156] According to a second embodiment, a layer 1 according to the invention can be applied to a layer 2 obtained by SPS with a porous dense columnar microstructure ( Figure 4 Layer 7) in the middle.
[0157] According to a third embodiment, a layer 1 according to the invention can be applied to a layer 2 with a columnar microstructure obtained by EB-PVD ( Figure 5 on layer 8) in
[0158] Advantageously, layer 2 can have a thermal and / or environmental insulation function. This layer can also (but is not limited to) guarantee good properties in terms of service life, thermal insulation or protection against oxidation and moisture corrosion.
[0159] Advantageously, layer 3 acts as an adhesive layer.
[0160] Layer 3 may be selected from metals; metal alloys such as β-NiAl metal a...
Embodiment 1
[0187] In this embodiment, the anti-CMAS layer according to the invention is prepared by the method according to the invention (see image 3 ).
[0188] by Gd 2 Zr 2 o 7 The compositional anti-CMAS layer 1 is prepared on the surface of the porous columnar YSZ layer 6 obtained by the SPS method. By the SPS method using d 90 Less than 10μm (ie d 90 is 7μm) and d 50 A suspension of primary particles greater than or equal to 1 μm (ie 3 μm) was used to prepare the anti-CMAS layer.
[0189] A sample thus prepared consisting of an anti-CMAS layer on a substrate fell into figure 1 and figure 2 within the range of the system shown.
[0190] image 3 A scanning electron microscope (SEM) micrograph using backscattered electrons using a polished portion of the sample prepared in this example is shown.
Embodiment 2
[0192] In this example, the anti-CMAS layer according to the invention was produced by the method according to the invention.
[0193] by Gd 2 Zr 2 o 7 The compositional anti-CMAS layer 1 was prepared on the surface of the columnar dense porous YSZ layer 7 obtained by the SPS method. By the SPS method using d 90 Less than 10μm (ie d 90 is 7μm) and d 50 A suspension of primary particles greater than or equal to 1 μm (ie 3 μm) was used to prepare the anti-CMAS layer.
[0194] A sample thus prepared consisting of an anti-CMAS layer on a substrate fell into figure 1 and figure 2 within the range of the system shown.
[0195] Figure 4 A scanning electron microscope (SEM) micrograph using backscattered electrons using a polished portion of the sample prepared in this example is shown.
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