Unlock instant, AI-driven research and patent intelligence for your innovation.

Source reagent-based delivery of fluid with high material flux for batch deposition

A technology of reagents and substances, applied in the field of delivery of high-substance flux fluids for batch deposition based on source reagents, can solve complex and other problems

Pending Publication Date: 2019-07-05
ENTEGRIS INC
View PDF6 Cites 0 Cited by
  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

However, filtering particles from larger reagent vapor streams (such as can be used for bulk deposition or injection) can be more complex than filtering smaller reagent vapor streams

Method used

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
View more

Image

Smart Image Click on the blue labels to locate them in the text.
Viewing Examples
Smart Image
  • Source reagent-based delivery of fluid with high material flux for batch deposition
  • Source reagent-based delivery of fluid with high material flux for batch deposition
  • Source reagent-based delivery of fluid with high material flux for batch deposition

Examples

Experimental program
Comparison scheme
Effect test

Embodiment Construction

[0043] The present disclosure relates to vaporizer vessel apparatus, reagent support trays, particle suppression devices, methods for vaporizing source reagents, and other aspects of reagent vapor deposition or infusion that produce reagent species. In a specific embodiment, the vaporizer vessel is configured to generate a large volume of reagent vapor to allow deposition and injection of reagent vapor for batches of wafers or other objects, rather than for individual wafers or objects.

[0044] According to the present disclosure, a reagent support disc within a stack of reagent support discs for a vaporizer container includes a plurality of gas flow openings. The gas flow openings may comprise channels in one or more partitions within the reagent support tray, or may be located on the side of the one or more reagent support trays. Channels within the partition may be arranged to extend below the floor of a particular reagent support disc to redirect gas at the base of the su...

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

PUM

PropertyMeasurementUnit
diameteraaaaaaaaaa
diameteraaaaaaaaaa
Login to View More

Abstract

The present invention relates to source reagent-based delivery of fluid with high material flux for batch deposition. The present invention discloses a system, reagent support trays, particle suppression devices, and methods. In one aspect, a system includes a vaporizer vessel having one or more interior walls enclosing an interior volume and a plurality of reagent support trays configured to be vertically stackable within the interior volume. Each of the plurality of reagent support trays is configured to be vertically stackable within the interior volume to form a stack of reagent support trays. One or more of the plurality of reagent support trays is configured to redirect a flow of a gas passing between adjacent reagent support trays in the stack of reagent support trays to cause the flow of gas to interact with the source reagent material in a particular reagent support tray before passing into a next of the plurality of reagent support trays in the stack of reagent support trays.

Description

[0001] This application is a divisional application of an invention patent application with an application date of May 31, 2013, an application number of "201380038921.0", and an invention title of "Transportation of high-flux fluids for batch deposition based on source reagents" . [0002] References to related applications [0003] Applicant Bryan C. Hendrix et al.'s U.S. Provisional Patent Application No. 61 / 654,077 priority interest. The entire disclosure of US Provisional Patent Application No. 61 / 654,077 is hereby incorporated by reference for all purposes. technical field [0004] The present disclosure relates to vaporization apparatus and systems, and related methods, for vaporizing source reagent species, such as liquid and solid source reagents, used during chemical vapor deposition (CVD), atomic layer deposition (ALD), and ion implantation techniques. Background technique [0005] When utilizing liquid and solid substances as source reagents for vapors in CV...

Claims

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

Application Information

Patent Timeline
no application Login to View More
Patent Type & Authority Applications(China)
IPC IPC(8): C23C16/44C23C16/448C23C16/455C23C16/458
CPCC23C16/4402C23C16/4481B01B1/005C23C16/44C23C16/458C23C16/4401C23C16/455C23C14/48
Inventor 布赖恩·C·亨德里克斯约翰·N·格雷格斯科特·L·巴特尔唐·K·纳伊托凯勒·巴托什约翰·M·克利里泽布姆·琴约尔丹·霍奇斯
Owner ENTEGRIS INC