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Method for monitoring function of continuous depth-of-field extension program of scanning lithography machine

A technology of depth of field expansion and lithography machine, which is applied in the functional field of monitoring and scanning lithography machine continuous depth of field expansion program, can solve the problems of lack of CDP monitoring methods, and achieve the effect of improving the process window

Inactive Publication Date: 2019-07-12
SHANGHAI HUAHONG GRACE SEMICON MFG CORP
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0006] However, whether it is for lithography machine manufacturers or semiconductor wafer manufacturing plants, there are few researches on CDP functions, and there is a lack of monitoring methods for CDP functions.

Method used

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  • Method for monitoring function of continuous depth-of-field extension program of scanning lithography machine
  • Method for monitoring function of continuous depth-of-field extension program of scanning lithography machine
  • Method for monitoring function of continuous depth-of-field extension program of scanning lithography machine

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Embodiment Construction

[0021] The method for monitoring the continuous depth-of-field extension program function of the scanning lithography machine of the present invention realizes the monitoring of the continuous-depth-of-field extension program function by monitoring the uniformity of feature sizes.

[0022] Due to the continuous depth of field extension program function of the lithography machine, the scanning lithography machine cannot guarantee the uniformity of the feature size within the full focal length range when it is not turned on. image 3 In the table shown in the table, when the CDP function is not turned on, it can be seen that when the focal length Focus = -0.25 / 0.05, the characteristic size CD of the ISO sample varies greatly, and the uniformity is obviously poor.

[0023] Therefore, by monitoring the uniformity of the feature size of the ISO sample under defocusing conditions, it is possible to monitor the CDP function.

[0024] The specific operation method is to make a standard wafer,...

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Abstract

The invention discloses a method for monitoring the function of a continuous depth-of-field extension program of a scanning lithography machine. The monitoring of the function of the depth-of-field extension program is achieved by monitoring the uniformity of the feature size of an ISO sample under a defocus condition. According to the method, the monitoring of the function of the depth-of-field extension program of the scanning lithography machine can be effectively achieved to improve a process window.

Description

Technical field [0001] The invention relates to the field of semiconductor device manufacturing and testing, in particular to a method for monitoring the function of a continuous depth of field extension program of a scanning lithography machine. Background technique [0002] Photoetching or lithography is a process of removing a specific part of the film on the surface of a wafer through a series of production steps. After that, a thin film with a micro-pattern structure will be left on the wafer surface. Through the photolithography process, the feature pattern part is finally retained on the wafer. The goal of lithography production is to generate feature patterns with accurate dimensions according to the requirements of circuit design, and the position on the wafer surface is correct and the association with other parts is correct. [0003] Lithography is the most critical step in the basic process. Lithography determined the critical dimensions of the device. Errors in the...

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): G03F7/20
CPCG03F7/2051G03F7/70358
Inventor 王辉
Owner SHANGHAI HUAHONG GRACE SEMICON MFG CORP