Device for synchronously polishing in bulk with multiple working stations and same working procedure

Abstract

The invention relates to a device for synchronously polishing in bulk with multiple working stations and a same working procedure. The device comprises a base 1, two or more than two sets of polishingdevices 3 and a sliding mechanism 2, wherein the sliding mechanism 2 is assembled on the base 1, and the sliding mechanism 2 comprises a multi-direction synchronous movement platform 203, two or three sets of sliding devices 201 and a sliding controlling device 202; the sliding devices comprise guide rails 201a and sliding sleeves 201b, and two or three sets of sliding devices 201 are perpendicular to each other; the multi-direction synchronous movement platform 203 is assembled on the sliding devices 201 on the upper portion, the multi-direction synchronous movement platform 203 comprises two or more than two sets of machining platforms 203a, and the polishing devices 3 are assembled on the machining platforms 203a; the synchronous movement platforms 203 synchronously moves a plurality of polishing devices 3, the polishing devices 3 can synchronously polish one row of same parts with a same working procedure, so that machining in bulk is efficiently realized.

Description

technical field [0001] The invention relates to a multi-station same-process synchronous batch polishing equipment in automatic batch-automatic polishing processing with the same process. Background technique [0002] The polishing process of many parts has the characteristics of mass production. At present, the multi-workpiece automatic polishing equipment mainly adopts the multi-station and multi-process integrated polishing solution. This technical solution includes multiple independent polishing devices and a rotary with multiple processing stations. Platform, each polishing wheel device is arranged around the rotating platform. After the processed parts are processed in one process station, the rotating platform rotates once to enter the next processing process station, and the processed parts rotate one circle from storage to pick-up. The advantage of this scheme is that it meets The need for multiple polishing processes on the surface of the same part, this technical ...

AI Technical Summary

Problems solved by technology

[0002] The polishing process of many parts has the characteristics of mass production. At present, the multi-workpiece automatic polishing equipment mainly adopts the multi-station and multi-process integrated polishing solution. This technical solution includes multiple independent polishing devices and a rotary with multiple processing stations. Platform, each polishing wheel device is arranged around the rotating platform. After the processed parts are processed in one process station, the rotating platform rotates once to enter the next processing process station, and the processed parts rotate one circle from storage to pick-up. The advantage of this scheme is that it meets The need for multiple polishing processes on the surface of the same part, this technical solution has one or more of the following disadvantages: 1. The surfaces processed by different parts are different, which can only meet the batch processing of some parts: 2. The parts that process different processes When the number of workpieces to be accessed is different, for example, when the equipment processes parts with 4 polishing processes and parts with 2 polishing processes, the number of parts with 2 polishing processes and parts with 4 polishing processes is different , the number of stations of the same equipment cannot be changed, and the number and location of polishing devices are also difficult to change. In this way, when processing parts with different polishing processes, the stations for accessing parts and polishing stations often do not match. When the equipment is working , some workstations and some polishing devices are idle, and the utilization efficiency of the equipment is low

3. When processing different parts, each polishing device of the same equipment and each workpiece table of the rotary platform need to set different programs and data, and the efficiency of intermediate replacement is low; 4. The structure is complex, and each polishing device and workpiece table are designed to meet different parts. Different surface processing needs to simulate manual polishing action, there are many internal control mechanisms, and the reliability is low; 5. The processing time of different processes of the same workpiece is different, and it can only be rotated and replaced one at a time after the polishing of all workpieces on the rotary platform is completed. , the polishing efficiency is low; 6. Since the circumference of the polishing device is distributed around the rotating platform, the structure of the polishing device and the platform are complex and occupy a large space

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