Vacuum evaporation substrate and vacuum evaporation device

Abstract

The application discloses a vacuum evaporation substrate and a vacuum evaporation device. The vacuum evaporation substrate comprises a conductive pattern located on one side of a substrate body, wherein the conductive pattern can be connected with a current source, and generates a magnetic field under action of currents provided by the current source. Due to the fact that the magnetic field can interact with a magnetic field generated by a magnetic mechanism in the vacuum evaporation device so as to enable the magnetic mechanism to generate magnetic force of certain intensity and direction forthe vacuum evaporation substrate, a function of adsorbing or rejecting the vacuum evaporation substrate can be achieved, and furthermore by improving the drooping degree of the middle area of the vacuum evaporation substrate, an open area on a masking plate and an area of a material layer to be formed on the vacuum evaporation substrate can be accurately aligned, and then vacuum evaporation effects are ensured.

Description

technical field [0001] The invention relates to the field of display technology, in particular to an evaporation substrate and evaporation equipment. Background technique [0002] Evaporation process is a process that uses a mask to form a desired material layer on an evaporation substrate by evaporation. [0003] At present, during evaporation, a mask plate can be attached to the side of the evaporation substrate close to the evaporation source. The evaporation source can evaporate the evaporation material on the evaporation substrate through the opening area on the mask, so as to form a required material layer on the evaporation substrate. [0004] However, during the evaporation process, the evaporation substrate may sag due to its own gravity, so that the opening area on the mask plate cannot be accurately aligned with the area on the evaporation substrate where the material layer is to be formed. Contents of the invention [0005] The embodiment of the present inven...

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Problems solved by technology

[0005] The embodiment of the present invention provides an evaporation substrate and evaporation equipment, which can solve the problem in the related art that the opening area on the mask plate cannot be accurately aligned with the area on the evaporation substrate where a material layer is to be formed. The technical solution as follows:

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