Plated hole copper device
A technology of electroplating holes and electroplating tanks, applied in the direction of plating tanks, etc., can solve the problem of poor uniformity of copper thickness in holes, and achieve the effect of improving uniformity
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Embodiment 1
[0049] This embodiment provides a copper plating device, such as figure 1 and 2 As shown, it includes an electroplating tank 0 and an anode 2 and a cathode 3 arranged in the electroplating tank 0. Specifically, the shape of the electroplating tank 0 can be selected according to needs. For example, the electroplating tank 0 is a cubic electroplating tank, and it also includes,
[0050] The liquid spray pipe 4 is arranged between the anode 2 and the cathode 3, and is located in the electroplating tank 0. The extension direction of the liquid spray pipe 4 is consistent with the extension direction of the cathode 3 and the two are oppositely arranged, along the extension direction of the liquid spray pipe 4 Above, a plurality of nozzles 5 are arranged at intervals on the liquid spray pipe 4 to spray the electroplating solution toward the surface of the cathode 3; specifically, the liquid spray pipe 4 is a straight pipe, and several nozzles 5 are arranged at intervals on the side o...
Embodiment 2
[0057] This embodiment provides a copper plating device. On the basis of the above-mentioned embodiment 1, one end of the liquid spray pipe 4 is a liquid inlet end, and the opposite end is a closed end. Along the direction from the liquid inlet end to the closed end, adjacent The distance between the nozzles becomes smaller, and this setting can avoid the influence of the pressure at different positions in the spray pipe 4 on the spray flow, so that the pressure of the electroplating solution sprayed by each nozzle tends to be consistent, thereby ensuring the uniformity of copper plating during the electroplating process ; Specifically, along the direction from the liquid inlet end to the closed end, the distance between adjacent nozzles decreases gradually in a gradient.
Embodiment 3
[0059] This embodiment provides a copper plating device. On the basis of the above-mentioned embodiment 1 or 2, as a variable embodiment, one end of the liquid spray pipe 4 is a liquid inlet end, and the opposite end is a closed end. In the direction from the end to the closed end, the opening area of the previous nozzle is larger than that of the latter nozzle. This setting can also avoid the influence of the pressure of different positions in the spray pipe 4 on the spray flow, so that the pressure of the electroplating solution ejected from each nozzle tends to be consistent, thereby ensuring the uniformity of copper plating in the electroplating process; specifically, along the In the direction from the liquid end to the closed end, the opening area of the nozzle is larger than that of the latter nozzle and gradually decreases in a gradient.
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