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Foreign body repair method, device and storage medium

A technology for storage media and foreign objects, which is used in instruments, semiconductor/solid-state device testing/measurement, semiconductor devices, etc., can solve problems affecting product yield and other problems, and achieve the effect of reducing photoresist residue and coating residue phenomenon and reducing the impact.

Active Publication Date: 2021-09-03
TCL CHINA STAR OPTOELECTRONICS TECH CO LTD
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0005] This application provides a foreign matter repair method tube, device and storage medium, which can solve the technical problem that foreign matter affects product yield

Method used

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  • Foreign body repair method, device and storage medium
  • Foreign body repair method, device and storage medium
  • Foreign body repair method, device and storage medium

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Embodiment Construction

[0041] The technical solutions in the present application will be described in conjunction with the drawings in the present application embodiments. Obviously, the described embodiments are merely embodiments, not all of the embodiments. Based on the embodiments in the present application, those skilled in the art do not have all other embodiments obtained without making creative labor, which are the scope of the present application.

[0042] See figure 1 , figure 1 A flow chart of foreign matter repairing methods provided in the embodiment of the present application. like figure 1 As shown, the foreign matter repair method provided by the present application includes the following steps: 101, a photoresist layer is formed on the substrate, and the photoresist layer is partially divided to obtain a plurality of pending regions; 103 The height of each of the above-to-be tested areas is obtained, and the height of the foreign matter region is adjusted by comparing the foreign matter...

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Abstract

In the foreign matter repair method, device and storage medium provided in the present application, a photoresist layer is formed on the substrate, and the photoresist layer is divided into regions to obtain a plurality of regions to be tested, and each of the regions to be tested is obtained. measure the height of the area, and obtain a plurality of foreign matter areas in the area to be measured by comparing, and adjust the foreign matter repair method of the height of the foreign matter area, the height of the foreign matter area can be adjusted to the height threshold, so that the height of the foreign matter area can be adjusted Repair foreign matter to reduce the occurrence of photoresist residue and coating residue, thereby reducing the impact of foreign matter on product yield.

Description

Technical field [0001] The present application relates to the field of display, and more particularly to a foreign matter repair method, a device, and a storage medium. Background technique [0002] Currently, in the field of display technology, liquid crystal displays and organic light emitting diodes have become mainstream flat panel display technologies. [0003] In recent years, in the film formation process of the liquid crystal display and organic light emitting diode, foreign matter has always been a large-scale killer, and the partially dimensions are high but highly high-profile foreign matter is extremely easily caused by photoresist to form residual and coating residues, resulting in a substrate scrap. Produce losses. [0004] Therefore, how to repair foreign objects make foreign objects no longer affect product yield is the difficulty of all world panel manufacturers working hard. Inventive content [0005] This application provides a foreign matter repair method tub...

Claims

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Application Information

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Patent Type & Authority Patents(China)
IPC IPC(8): H01L21/66H01L27/32G02F1/13
CPCH01L22/20G02F1/1309H10K59/00
Inventor 谭锦程
Owner TCL CHINA STAR OPTOELECTRONICS TECH CO LTD