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Mask facilitating film thickness measurement by using step profiler

A mask and step meter technology, applied in the field of mask, can solve the problem of inability to measure the thickness of the metal electrode coating on the surface of the sensor, etc.

Inactive Publication Date: 2019-11-19
INSPUR ARTIFICIAL INTELLIGENCE RES INST CO LTD SHANDONG CHINA
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

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Problems solved by technology

[0004] The technical problem to be solved by the present invention is: the present invention mainly solves the problem that the coating thickness of the metal electrode on the surface of the sensor cannot be directly measured by a step meter after coating the sensor

Method used

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  • Mask facilitating film thickness measurement by using step profiler
  • Mask facilitating film thickness measurement by using step profiler
  • Mask facilitating film thickness measurement by using step profiler

Examples

Experimental program
Comparison scheme
Effect test

Embodiment 1

[0033] figure 1 It is a schematic diagram of the structure of the first sub-mask of the present invention, and its structure includes four corner fixing screw holes, a film thickness measurement shielding area 1 and several opening areas 2;

[0034] figure 2 It is a schematic diagram of the structure of the second sub-mask of the present invention, and its structure includes four corner fixing screw holes, a film thickness measurement area 4 and several substrate holding areas 5;

[0035] image 3 It is a schematic diagram of the structure of the third layer of the sub-mask of the present invention, which is a flat plate structure, providing support for the above-mentioned two-layer sub-mask and the substrate to be coated; the positions corresponding to the four corners are provided with fixing screw holes for fixed assembly during coating use;

[0036] The film thickness measurement shielding area 1 of the first layer of sub-mask corresponds to the opening position of the...

Embodiment 2

[0042] On the basis of Embodiment 1, the position of the film thickness measurement shielding area of ​​the first sub-mask plate described in this embodiment is provided with a film thickness measurement shielding slider 3, and the film thickness measurement shielding slider 3 can measure along the film thickness. Blocking area 1 moves longitudinally in the plane of the first sub-mask, such as Figure 4 As shown, by adjusting the position of the film thickness measurement shielding slider 3 to be flush with the row where the substrate to be coated is placed, the coating thickness of the row of substrates is measured.

[0043] The use steps when the mask plate is coated are as follows:

[0044] 1. When using, align the fixing screw holes of the second sub-mask with the fixing screw holes of the third sub-mask and place them horizontally;

[0045] 2. Put the substrate to be coated into the substrate holding area of ​​the second sub-mask;

[0046] 3. Align the fixing screw hole...

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Abstract

The invention discloses a mask facilitating film thickness measurement by using a step profiler. The mask structurally comprises three sub-mask bodies; the first-layer sub-mask body comprises two areas, namely a film thickness measurement shielding area and an opening area; the second-layer sub-mask body is divided into two areas, namely a film thickness measurement area and a substrate containingarea; and the third-layer sub-mask body is of a flat plate structure and provides support for the other two layers of sub-mask bodies and a substrate to be coated. The mask has the advantages that the problem that the thickness of a metal electrode coating on the surface of the substrate of a sensor and the like cannot be directly measured by using the step profiler after the sensor is coated canbe mainly solved, through the size design of the film thickness measurement shielding area and a film thickness measurement shielding sliding block, enough distance can be provided for the movement of a probe of the step profiler, and therefore the edge of the shielding area can be conveniently measured by using the step profiler after each coating experiment so as to acquire the step height difference of the edge of the shielding area.

Description

technical field [0001] The invention relates to the technical field of microstructure processing, in particular to a mask plate which is convenient for measuring film thickness by using a step meter. Background technique [0002] The step meter belongs to the contact surface topography measuring instrument. According to the different sensors used, the contact step measurement can be divided into three types: inductive, piezoelectric and photoelectric. The measurement principle is: when the stylus slides gently along the surface to be tested, the stylus also moves up and down along the peaks and valleys while sliding due to the tiny peaks and valleys on the surface. The movement of the stylus reflects the surface profile. After the electrical signal output by the sensor passes through the measuring bridge, it outputs an amplitude modulation signal proportional to the displacement of the stylus from the equilibrium position. After amplification and phase-sensitive rectificat...

Claims

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Application Information

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IPC IPC(8): C23C14/04C23C16/04
CPCC23C14/042C23C16/042
Inventor 刘幼航刘强聂鸿飞
Owner INSPUR ARTIFICIAL INTELLIGENCE RES INST CO LTD SHANDONG CHINA
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