A kind of tem sample and preparation method thereof
A sample and sample preparation technology, which is used in the preparation, sampling, and instrumentation of samples for testing. It can solve the problems of damaged samples, unusable samples as a whole, and difficulty in maintaining sample uniformity. effect of influence
Active Publication Date: 2022-06-28
YANGTZE MEMORY TECH CO LTD
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Problems solved by technology
However, the thinner the sample, the more susceptible it is to damage the sample due to the curtain effect, such as image 3 As shown, the bottom of the sample rolls up to the top, rendering the sample unusable as a whole
Due to the unavoidable structural material differences in the sample, it is difficult to maintain the uniformity of the sample for some samples where the curtain effect cannot be avoided
Method used
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[0032] The above is the core idea of the present invention. In order to make the above objects, features and advantages of the present invention more obvious and easy to understand, the technical solutions in the embodiments of the present invention will be clearly and completely described below with reference to the accompanying drawings in the embodiments of the present invention. Description, it is obvious that the described embodiments are only some, but not all, embodiments of the present invention. Based on the embodiments of the present invention, all other embodiments obtained by those of ordinary skill in the art without creative efforts shall fall within the protection scope of the present invention.
[0033] The embodiment of the present invention provides a preparation method of a TEM sample, such as Figure 4 shown, including:
[0034] S101: provide the sample to be prepared;
[0035] In the embodiment of the present invention, the sample to be prepared is a t...
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The invention provides a TEM sample and a preparation method thereof, comprising: providing a sample to be prepared; forming a first protective layer on the top of a target area of the sample to be prepared; forming a second protective layer on the bottom of the sample to be prepared ; Thinning toward the middle part of the sample to be prepared along both sides of the first protective layer to form a thin area containing the target area and abutments located on both sides of the thin area. Since the second protective layer is formed at the bottom of the sample to be prepared, in the process of thinning to the middle part of the sample to be prepared along both sides of the first protective layer, the second protective layer at the bottom makes the The bottom has a structural support, which can suppress the curling and deformation of the bottom of the sample, and weaken the influence of the curtain effect on the uniformity of the TEM sample.
Description
technical field [0001] The invention relates to the technical field of semiconductor manufacturing, and more particularly, to a TEM sample and a preparation method thereof. Background technique [0002] At present, Transmission Electron Microscope (TEM) is an important tool to detect the morphology, size and characteristics of thin films that make up semiconductor devices, and Focused Ion Beam (FIB) equipment is the main tool to complete the preparation of TEM samples. tool. [0003] In all semiconductor devices, due to the different materials used in various structures, the cutting speed of the ion beam on different materials will be different during FIB sample preparation, and then the curtain effect will occur, such as figure 1 As shown, a curtain-like strain is formed beneath the metal (eg, tungsten) 10 of greater mass within the sample due to the difference in cutting rate with the silicon oxide 11 of lower mass next to it. Usually the curtain effect can be reduced or...
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IPC IPC(8): G01N23/04G01N1/28
CPCG01N23/04G01N1/28G01N1/286G01N2001/2873
Inventor 邹锭
Owner YANGTZE MEMORY TECH CO LTD