Method and device for calibrating wafer center

A wafer and center technology, applied in the field of wafer calibration, can solve problems such as low detection efficiency and wafer center error, and achieve the effect of improving efficiency and avoiding errors

Active Publication Date: 2021-11-19
福建省福联集成电路有限公司
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  • Summary
  • Abstract
  • Description
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  • Application Information

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Problems solved by technology

[0003] For this reason, it is necessary to provide a wafer center calibration device, which is used to solve the technical problems of manual naked eye calibration of wafer center errors and low detection efficiency.

Method used

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  • Method and device for calibrating wafer center
  • Method and device for calibrating wafer center
  • Method and device for calibrating wafer center

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Embodiment Construction

[0040] In order to explain the technical content, constructive features, the purpose and effects of the technical solution, the following combination of the specific embodiments will be described with reference to the accompanying drawings.

[0041] See figure 1 , The device wafer structural diagram of a center calibration particular embodiment of the present invention.

[0042] The apparatus includes a wafer center stage calibration apparatus 1, block 2 units, distance measuring sensor 3, and a controller 4. The stage 1 is higher than the top surface of the distance measuring sensor 3, a distance measuring sensor 3 is disposed at one side of the stage, the stop of the distance measuring station 2 is located directly above the sensor 3. Preferably, the stop station comprises vertical uprights and horizontal table supporting the horizontal table top, table stop positioned directly above the sensor distance above the level of the table refers to the positive stop station located in ...

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Abstract

The invention relates to a device for calibrating the center of a wafer, comprising: a stage, a stopper, a distance measuring sensor and a controller; the top surface of the stage is higher than the distance measuring sensor, and the distance measuring sensor is arranged on one side of the stage , the block is located directly above the ranging sensor; the carrier is used to place the wafer and drive the wafer to move; the ranging sensor is used to obtain horizontal and vertical spacing information; the controller is connected to the ranging sensor to control The controller is used to control the carrier to rotate at a preset angle, or to control the carrier to move in a direction approaching or away from the distance measuring sensor. The information of the ranging sensor is processed by the controller to determine the wafer whose center position is shifted. It is possible to quickly screen out wafers whose center position is shifted, improve the efficiency of wafer center calibration, and effectively avoid manual detection errors.

Description

Technical field [0001] The present invention relates to a wafer alignment, and in particular relates to a method and apparatus for calibration wafer center. Background technique [0002] In recent years, whether the center of the wafer for the accurate placement of the artificial eye is commonly used in calibration mode. However, because there will be a visual manual calibration errors, and also needed additional manual calibration step is performed to find the edge of the wafer. At the same time, the existing machines due to an uncalibrated or find the center of the wafer edge finder and other issues, not only stops the current wafer operations, but also to stop the remaining wafer operations, greatly affected the efficiency. Inventive content [0003] To this end, the center of the wafer to provide a calibration apparatus for Solving the Problems artificial eye calibration wafer center error exists, and the lower detection efficiency. [0004] To achieve the above object, the ...

Claims

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Application Information

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Patent Type & Authority Patents(China)
IPC IPC(8): H01L21/68
CPCH01L21/68
Inventor 马跃辉黄光伟李立中林伟铭陈智广吴淑芳庄永淳吴靖
Owner 福建省福联集成电路有限公司
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